-
1
-
-
0035440751
-
Rapid thermal chemical vapor deposition of zirconium oxide for metal-oxide-semiconductor field effect transistor application
-
J.P. Chang, Y.S. Lin, and K. Chu: Rapid thermal chemical vapor deposition of zirconium oxide for metal-oxide-semiconductor field effect transistor application. J. Vac. Sci. Technol., B 19, 1782 (2001).
-
(2001)
J. Vac. Sci. Technol., B
, vol.19
, pp. 1782
-
-
Chang, J.P.1
Lin, Y.S.2
Chu, K.3
-
2
-
-
4344581438
-
The effect of interfacial layers on high-performance gate dielectrics processed by RTP-ALD
-
M. Fakhruddin, R. Singh, K.F. Poole, S.V. Kondapi, and J. Narayan: The effect of interfacial layers on high-performance gate dielectrics processed by RTP-ALD. J. Electrochem. Soc. 151, G507 (2004).
-
(2004)
J. Electrochem. Soc
, vol.151
-
-
Fakhruddin, M.1
Singh, R.2
Poole, K.F.3
Kondapi, S.V.4
Narayan, J.5
-
3
-
-
79956020229
-
2 dielectric stacks grown by ultraviolet-ozone oxidation
-
2 dielectric stacks grown by ultraviolet-ozone oxidation. Appl. Phys. Lett. 80, 3793 (2002).
-
(2002)
Appl. Phys. Lett
, vol.80
, pp. 3793
-
-
Ramanathan, S.1
McIntyre, P.C.2
-
4
-
-
17444428140
-
Structural and electrical properties of Zr oxide film for high-k gate dielectrics by using electron cyclotron resonance plasma sputtering
-
J. Wang, L. Zhao, N.H. Lim, D. Wang, and H. Nakashima: Structural and electrical properties of Zr oxide film for high-k gate dielectrics by using electron cyclotron resonance plasma sputtering. Appl. Phys. A, Mater. 80, 1781 (2005).
-
(2005)
Appl. Phys. A, Mater
, vol.80
, pp. 1781
-
-
Wang, J.1
Zhao, L.2
Lim, N.H.3
Wang, D.4
Nakashima, H.5
-
6
-
-
33847128789
-
Yttria-stabilized zirconia thermal-barrier coatings - A review
-
L.B. Chen: Yttria-stabilized zirconia thermal-barrier coatings - A review. Surf. Rev. Lett. 13, 535 (2006).
-
(2006)
Surf. Rev. Lett
, vol.13
, pp. 535
-
-
Chen, L.B.1
-
7
-
-
10844274143
-
Review on advanced EB-PVD ceramic topcoats for TBC applications
-
U. Schulz, B. Saruhan, K. Fritscher, and C. Leyens: Review on advanced EB-PVD ceramic topcoats for TBC applications. Int. J. Appl. Ceram. Technol. 1, 302 (2004).
-
(2004)
Int. J. Appl. Ceram. Technol
, vol.1
, pp. 302
-
-
Schulz, U.1
Saruhan, B.2
Fritscher, K.3
Leyens, C.4
-
8
-
-
0038727643
-
-
2 coatings for thermal barrier applications. \ J. Therm. Spray Technol. 12, 214 (2003).
-
2 coatings for thermal barrier applications. \ J. Therm. Spray Technol. 12, 214 (2003).
-
-
-
-
9
-
-
4544311785
-
Application of thermal-barrier coatings on combustion chamber liners - A review
-
B. Goswami, S.K. Sahay, and A.K. Ray: Application of thermal-barrier coatings on combustion chamber liners - A review. High Temp. Mater. Pr.-Isr. 23, 211 (2004).
-
(2004)
High Temp. Mater. Pr.-Isr
, vol.23
, pp. 211
-
-
Goswami, B.1
Sahay, S.K.2
Ray, A.K.3
-
10
-
-
33344460549
-
Evolution of Young's modulus of air plasma sprayed yttria-stabilized zirconia in thermally cycled thermal-barrier coatings
-
F. Tang and J.M. Schoeming: Evolution of Young's modulus of air plasma sprayed yttria-stabilized zirconia in thermally cycled thermal-barrier coatings. Scr. Mater. 54, 1587 (2006).
-
(2006)
Scr. Mater
, vol.54
, pp. 1587
-
-
Tang, F.1
Schoeming, J.M.2
-
12
-
-
33745303462
-
A study of screen printed yttria-stabilized zirconia layers for solid oxide fuel cells
-
P. Von Dollen and S. Barnett: A study of screen printed yttria-stabilized zirconia layers for solid oxide fuel cells. J. Am. Ceram. Soc. 88, 3361 (2005).
-
(2005)
J. Am. Ceram. Soc
, vol.88
, pp. 3361
-
-
Von Dollen, P.1
Barnett, S.2
-
13
-
-
0012780320
-
Unique precursor delivery and control afforded by low-pressure pulsed-CVD process with ultrasonic atomization
-
S. Krumdieck, O. Sbaizero, and R. Raj: Unique precursor delivery and control afforded by low-pressure pulsed-CVD process with ultrasonic atomization. J. Phys. [E] IV 11, 1161 (2001).
-
(2001)
J. Phys. [E] IV
, vol.11
, pp. 1161
-
-
Krumdieck, S.1
Sbaizero, O.2
Raj, R.3
-
14
-
-
0032652998
-
Conversion efficiency or alkoxide precursor to oxide films grown by an ultrasonic-assisted, pulsed liquid injection, metalorganic chemical vapor deposition (pulsed-CVD) process
-
S. Krumdieck and R. Raj: Conversion efficiency or alkoxide precursor to oxide films grown by an ultrasonic-assisted, pulsed liquid injection, metalorganic chemical vapor deposition (pulsed-CVD) process. J. Am. Ceram. Soc. 82, 1605 (1999).
-
(1999)
J. Am. Ceram. Soc
, vol.82
, pp. 1605
-
-
Krumdieck, S.1
Raj, R.2
-
15
-
-
36049034276
-
Development of a model for high precursor conversion efficiency pulsed-pressure chemical vapor deposition (PP-CVD) processing
-
H.M. Cave, S.P. Krumdieck, and M.C. Jermy: Development of a model for high precursor conversion efficiency pulsed-pressure chemical vapor deposition (PP-CVD) processing. Chem. Eng. J. 135, 120 (2008).
-
(2008)
Chem. Eng. J
, vol.135
, pp. 120
-
-
Cave, H.M.1
Krumdieck, S.P.2
Jermy, M.C.3
-
16
-
-
0032656081
-
2 film growth by chemical vapor deposition using zirconium tetra-tert-butoxide
-
2 film growth by chemical vapor deposition using zirconium tetra-tert-butoxide. Thin Solid Films 348, 90 (1999).
-
(1999)
Thin Solid Films
, vol.348
, pp. 90
-
-
Cameron, M.A.1
George, S.M.2
-
17
-
-
17044394360
-
Growth mode during initial stage of chemical vapor deposition
-
Y. Kajikawa and S. Noda: Growth mode during initial stage of chemical vapor deposition. Appl. Surf. Sci. 245, 281 (2005).
-
(2005)
Appl. Surf. Sci
, vol.245
, pp. 281
-
-
Kajikawa, Y.1
Noda, S.2
-
18
-
-
0035806006
-
Growth rate and morphology for ceramic films by pulsed-MOCVD
-
S. Krumdieck and R. Raj: Growth rate and morphology for ceramic films by pulsed-MOCVD. Surf Coat. Technol. 141, 7 (2001).
-
(2001)
Surf Coat. Technol
, vol.141
, pp. 7
-
-
Krumdieck, S.1
Raj, R.2
-
19
-
-
0036863686
-
Solid yttria-stabilized zirconia films by pulsed chemical vapor deposition from metal-organic precursors
-
S.P. Krumdieck, O. Sbaizero, A. Bullert, and R. Raj: Solid yttria-stabilized zirconia films by pulsed chemical vapor deposition from metal-organic precursors. J. Am. Ceram. Soc. 85, 2873 (2002).
-
(2002)
J. Am. Ceram. Soc
, vol.85
, pp. 2873
-
-
Krumdieck, S.P.1
Sbaizero, O.2
Bullert, A.3
Raj, R.4
-
20
-
-
0000876411
-
2 thin films
-
2 thin films. Chem. Vap. Deposition 8, 163 (2002).
-
(2002)
Chem. Vap. Deposition
, vol.8
, pp. 163
-
-
Williams, P.A.1
Roberts, J.L.2
Jones, A.C.3
Chalker, P.R.4
Tobin, N.L.5
Bickley, J.F.6
Davies, H.O.7
Smith, L.M.8
Leedham, T.J.9
-
21
-
-
50449099543
-
-
W.S. Rasband: ImageJ, in U.S. National Institutes of Health, (Bethesda, MD, 1997-2006).
-
W.S. Rasband: ImageJ, in U.S. National Institutes of Health, (Bethesda, MD, 1997-2006).
-
-
-
-
22
-
-
0031001597
-
Cross-section TEM sample preparation of multilayer and poorly adhering films
-
L. Weaver: Cross-section TEM sample preparation of multilayer and poorly adhering films. Microsc. Res. Technol. 36, 368 (1997).
-
(1997)
Microsc. Res. Technol
, vol.36
, pp. 368
-
-
Weaver, L.1
-
23
-
-
0036201801
-
A study of CVD growth kinetics and film microstructure of zirconium dioxide from zirconium tetra-tert-butoxide
-
D.J. Burleson, J.T. Roberts, W.L. Gladfelter, S.A. Campbell, and R.C. Smith: A study of CVD growth kinetics and film microstructure of zirconium dioxide from zirconium tetra-tert-butoxide. Chem. Mater. 14, 1269 (2002).
-
(2002)
Chem. Mater
, vol.14
, pp. 1269
-
-
Burleson, D.J.1
Roberts, J.T.2
Gladfelter, W.L.3
Campbell, S.A.4
Smith, R.C.5
-
24
-
-
9144262505
-
2 and Zr-C-N coatings from chemical vapor deposition of metal-organic precursors
-
2 and Zr-C-N coatings from chemical vapor deposition of metal-organic precursors. Z. Anorg. Allg. Chem. 630, 2042 (2004).
-
(2004)
Z. Anorg. Allg. Chem
, vol.630
, pp. 2042
-
-
Mathur, S.1
Altmayer, J.2
Shen, H.3
-
25
-
-
50449105362
-
-
Powder Diffraction File, Card No. 30-1468 and Card No. 17-0923, (Joint Committee on Powder Diffraction Standards, Swathmore, PA).
-
Powder Diffraction File, Card No. 30-1468 and Card No. 17-0923, (Joint Committee on Powder Diffraction Standards, Swathmore, PA).
-
-
-
-
26
-
-
4644253917
-
High-speed deposition of yttria stabilized zirconia by MOCVD
-
R. Tu, T. Kimura, and T. Goto: High-speed deposition of yttria stabilized zirconia by MOCVD. Surf Coat. Technol. 187, 238 (2004).
-
(2004)
Surf Coat. Technol
, vol.187
, pp. 238
-
-
Tu, R.1
Kimura, T.2
Goto, T.3
-
28
-
-
10144252474
-
Application of novel aerosol-assisted chemical vapor deposition techniques for SOFC thin films
-
G.Y. Meng, H.Z. Song, Q. Dong, and D.K. Peng: Application of novel aerosol-assisted chemical vapor deposition techniques for SOFC thin films. Solid State Ionics 175, 29 (2004).
-
(2004)
Solid State Ionics
, vol.175
, pp. 29
-
-
Meng, G.Y.1
Song, H.Z.2
Dong, Q.3
Peng, D.K.4
-
29
-
-
33847010199
-
Synthesis, structure, microstructure and mechanical characteristics of MO CVD deposited Zirconia films
-
O. Bernard, A.M. Huntz, M. Andrieux, W. Seiler, V. Ji, and S. Poissonnet: Synthesis, structure, microstructure and mechanical characteristics of MO CVD deposited Zirconia films. Appl. Sur. Sci. 253, 4626 (2007).
-
(2007)
Appl. Sur. Sci
, vol.253
, pp. 4626
-
-
Bernard, O.1
Huntz, A.M.2
Andrieux, M.3
Seiler, W.4
Ji, V.5
Poissonnet, S.6
-
30
-
-
0032662178
-
Expedient route to volatile zirconium metal-organic chemical vapor deposition precursors using amide synthons and implementation in yttria-stabilized zirconia film growth
-
J.A. Belot, R.J. McNeely, A. Wang, C.J. Reedy, T.J. Marks, G.P.A. Yap, and A.L. Rheingold: Expedient route to volatile zirconium metal-organic chemical vapor deposition precursors using amide synthons and implementation in yttria-stabilized zirconia film growth. J. Mater. Res. 14, 12 (1999).
-
(1999)
J. Mater. Res
, vol.14
, pp. 12
-
-
Belot, J.A.1
McNeely, R.J.2
Wang, A.3
Reedy, C.J.4
Marks, T.J.5
Yap, G.P.A.6
Rheingold, A.L.7
-
31
-
-
2942543290
-
Pulsed injection MOCVD of YSZ thin films onto dense and porous substrates
-
G. Garcia, J. Caro, J. Santiso, J.A. Pardo, A. Figueras, and A. Albrutis: Pulsed injection MOCVD of YSZ thin films onto dense and porous substrates. Chem. Vap. Deposition 9, 279 (2003).
-
(2003)
Chem. Vap. Deposition
, vol.9
, pp. 279
-
-
Garcia, G.1
Caro, J.2
Santiso, J.3
Pardo, J.A.4
Figueras, A.5
Albrutis, A.6
-
32
-
-
50449098403
-
-
2 thin films, in Novel Materials and Processes for Advanced CMOS, edited by M.I. Gardner, S. De Gendt, J-P. Maria, and S. Stemmer (Mater. Res. Soc. Symp Proc. 745, Warrendale, PA, 2003), pp. 191-196.
-
2 thin films, in Novel Materials and Processes for Advanced CMOS, edited by M.I. Gardner, S. De Gendt, J-P. Maria, and S. Stemmer (Mater. Res. Soc. Symp Proc. 745, Warrendale, PA, 2003), pp. 191-196.
-
-
-
-
33
-
-
0037461140
-
YSZ layers by pulsed-MOCVD on solid oxide fuel cell electrodes
-
S.P. Krumdieck, O. Sbaizero, A. Bullert, and R. Raj: YSZ layers by pulsed-MOCVD on solid oxide fuel cell electrodes. Surf. Coat. Technol. 167, 226 (2003).
-
(2003)
Surf. Coat. Technol
, vol.167
, pp. 226
-
-
Krumdieck, S.P.1
Sbaizero, O.2
Bullert, A.3
Raj, R.4
-
34
-
-
0031187407
-
Metal-ofganic vapor deposition of YSZ electrolyte layers for solid oxide fuel-cell applications
-
K.W. Chour, J. Chen, and R. Xu: Metal-ofganic vapor deposition of YSZ electrolyte layers for solid oxide fuel-cell applications. Thin Solid Films 304, 106 (1997).
-
(1997)
Thin Solid Films
, vol.304
, pp. 106
-
-
Chour, K.W.1
Chen, J.2
Xu, R.3
-
35
-
-
0343371544
-
A study of the microstructure of yttria-stabilized zirconia deposited by inductively coupled plasma spraying
-
I.H. Jung, K.K. Bae, M.S. Yang, and S.K. Ihm: A study of the microstructure of yttria-stabilized zirconia deposited by inductively coupled plasma spraying. J. Therm. Spray Technol. 9, 463 (2000).
-
(2000)
J. Therm. Spray Technol
, vol.9
, pp. 463
-
-
Jung, I.H.1
Bae, K.K.2
Yang, M.S.3
Ihm, S.K.4
-
36
-
-
34548859241
-
Densification and properties of zirconia prepared by three different sintering techniques
-
P. Dahl, I. Kaus, Z. Zhao, M. Johnsson, M. Nygren, K. Wiik, T. Grande, and M.A. Einarsrud: Densification and properties of zirconia prepared by three different sintering techniques. Ceram. Int. 33, 1603 (2007).
-
(2007)
Ceram. Int
, vol.33
, pp. 1603
-
-
Dahl, P.1
Kaus, I.2
Zhao, Z.3
Johnsson, M.4
Nygren, M.5
Wiik, K.6
Grande, T.7
Einarsrud, M.A.8
|