Solid yttria-stabilized zirconia films by pulsed chemical vapor deposition from metal-organic precursors

Journal of the American Ceramic Society

Volumn 85, Issue 11, 2002, Pages 2873-2875

  Krumdieck, Susan P ^a,b,c   Sbaizero, Orfeo ^a,b,d   Bullert, Angela ^a,b   Raj, Rishi ^a,b  

^a Boulder Material Systems LLC   (United States)

^b University of Colorado at Boulder   (United States)

^c UNIVERSITY OF CANTERBURY   (New Zealand)

^d UNIVERSITY OF TRIESTE   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; CERAMIC MATERIALS; FILM GROWTH; FILMS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MORPHOLOGY; OPTIMIZATION; SUBSTRATES; TOLUENE; YTTRIUM COMPOUNDS;

PRECURSORS; PULSED CHEMICAL VAPOR DEPOSITION; YTTRIUM METHOXYETHOXIDE; ZIRCONIUM-METHYL-BUTOXIDE;

ZIRCONIA;

EID: 0036863686     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1151-2916.2002.tb00549.x     Document Type: Article

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