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Zeitschrift fur Anorganische und Allgemeine Chemie

Volumn 630, Issue 12, 2004, Pages 2042-2048

Nanostructured ZrO2 and Zr-C-N coatings from chemical vapor deposition of metal-organic precursors

(3) Mathur, Sanjay a Altmayer, Jessica a Shen, Hao a

a INM LEIBNIZ INSTITUTE FOR NEW MATERIALS (Germany)

Author keywords

Chemical vapor deposition; Molecular precursors; Nanostructured thin films; Zirconium; Zirconium carbonitride; Zirconium oxide

Indexed keywords

AMIDE; IRON DERIVATIVE; NITROGEN DERIVATIVE; OXYGEN; ZIRCONIUM DERIVATIVE; ZIRCONIUM OXIDE;

ARTICLE; CHEMICAL COMPOSITION; CHEMICAL STRUCTURE; COMPARATIVE STUDY; FILM; HARDNESS; OXIDATION; SCANNING ELECTRON MICROSCOPY; TEMPERATURE DEPENDENCE; VAPOR; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 9144262505 PISSN: 00442313 EISSN: None Source Type: Journal
DOI: 10.1002/zaac.200400271 Document Type: Article

Times cited : (15)

References (46)

1
- 0347306977
- A. D. Mazzony, M. S. Conconi, E. F. Aglietti, Mater. Res. 2001, 4, 107.
- (2001) Mater. Res. , vol.4 , pp. 107
- Mazzony, A.D.¹ Conconi, M.S.² Aglietti, E.F.³

2
- 0003691078
- NY, USA, IOP Publishing, Bristol, UK, X1:1, X3:1
- D. A. Glocker, NY, USA, Handbook of Thin Film Process Technology, IOP Publishing, Bristol, UK, X1:1, X3:1, 1995.
- (1995) Handbook of Thin Film Process Technology
- Glocker, D.A.¹

3
- 0029378525
- K.-T. Rie, A. Gebauer, J. Wöhle, Surface Coatings Technol 1995, 74-75, 362.
- (1995) Surface Coatings Technol , vol.74-75 , pp. 362
- Rie, K.-T.¹ Gebauer, A.² Wöhle, J.³

4
- 0022489379
- H. Holleck, J. Vac. Sci. Technol. A 1986, 4, 2661.
- (1986) J. Vac. Sci. Technol. A , vol.4 , pp. 2661
- Holleck, H.¹

5
- 0026867155
- X. Y. Li, G. B. Li, F. J. Wang, T. C. Ma, D. Z. Yang, Vacuum 1992, 43, 653.
- (1992) Vacuum , vol.43 , pp. 653
- Li, X.Y.¹ Li, G.B.² Wang, F.J.³ Ma, T.C.⁴ Yang, D.Z.⁵

6
- 0029376079
- H. Berndt, A. -Q. Zeng, H. -R. Stock, P. Mayr, Surface Coatings Technol. 1995, 74-75, 369.
- (1995) Surface Coatings Technol. , vol.74-75 , pp. 369
- Berndt, H.¹ Zeng, A.Q.² Stock, H.R.³ Mayr, P.⁴

7
- 0142258757
- P. W. Gold, J. Loos, M. Kuhn, Mat.-wiss. Werkstofftech. 2003, 34, 919.
- (2003) Mat.-wiss. Werkstofftech. , vol.34 , pp. 919
- Gold, P.W.¹ Loos, J.² Kuhn, M.³

8
- 0027662862
- E. L. Sham, E. M. Farfán-Torres, S. Bruque-Gámez, Solid States Ionics 1993, 63-56, 45.
- (1993) Solid States Ionics , vol.56-63 , pp. 45
- Sham, E.L.¹ Farfán-Torres, E.M.² Bruque-Gámez, S.³

9
- 0033079667
- E. Budke, J. Krempel-Hesse, H. Maidhof, H. Schüssler, Surface Coatings Technol. 1999, 112, 108.
- (1999) Surface Coatings Technol. , vol.112 , pp. 108
- Budke, E.¹ Krempel-Hesse, J.² Maidhof, H.³ Schüssler, H.⁴

10
- 0035576552
- S. Chatterjee, S. K. Samanta, H. D. Banerjee, C. K. Maiti, Bull. Mater. Sci. 2001, 24, 579.
- (2001) Bull. Mater. Sci. , vol.24 , pp. 579
- Chatterjee, S.¹ Samanta, S.K.² Banerjee, H.D.³ Maiti, C.K.⁴

11
- 0031553456
- G. Bertrand, M. Mévrel, Thin Solid Films 1997, 292, 241.
- (1997) Thin Solid Films , vol.292 , pp. 241
- Bertrand, G.¹ Mévrel, M.²

12
- 0031187407
- K. W. Chour, J. Chen, R. Xu, Thin Solid Films 1997, 304, 106.
- (1997) Thin Solid Films , vol.304 , pp. 106
- Chour, K.W.¹ Chen, J.² Xu, R.³

13
- 0030258263
- S. Shimada, M. Inagaki, J. Mater. Res. 1996, 11, 2594.
- (1996) J. Mater. Res. , vol.11 , pp. 2594
- Shimada, S.¹ Inagaki, M.²

14
- 0036672187
- S. Niyomsoan, W. Grant, D. L. Olson, B. Mishra, Thin Solid Films 2002, 475, 187.
- (2002) Thin Solid Films , vol.475 , pp. 187
- Niyomsoan, S.¹ Grant, W.² Olson, D.L.³ Mishra, B.⁴

15
- 0037415941
- T. Delachaux, Ch. Hollenstein, F. Lévy, C. Verdon, Thin Solid Films 2003, 425, 113.
- (2003) Thin Solid Films , vol.425 , pp. 113
- Delachaux, T.¹ Hollenstein, Ch.² Lévy, F.³ Verdon, C.⁴

16
- 9144265422
- S. Kudapa, K. Narasimhan, P. Boppana, W. C. Russell, Surface Coatings Technol. 1999, 120, 259.
- (1999) Surface Coatings Technol. , vol.120 , pp. 259
- Kudapa, S.¹ Narasimhan, K.² Boppana, P.³ Russell, W.C.⁴

17
- 0034513326
- C. H. Ma, J. H. Huang, H. Chen, Surface Coatings Technol. 2000, 133-134, 289.
- (2000) Surface Coatings Technol. , vol.133-134 , pp. 289
- Ma, C.H.¹ Huang, J.H.² Chen, H.³

18
- 0040109700
- S. Jin, X. Y. Wen, Z. X. Gong, Y. C. Zhu, J. Appl. Phys. 1993, 74(4), 2886.
- (1993) J. Appl. Phys. , vol.74 , Issue.4 , pp. 2886
- Jin, S.¹ Wen, X.Y.² Gong, Z.X.³ Zhu, Y.C.⁴

19
- 0037024046
- M. Cassir, F. Goubin, C. Bernay, P. Vernoux, D. Lincot, Appl. Surf. Sci. 2002, 193, 120.
- (2002) Appl. Surf. Sci. , vol.193 , pp. 120
- Cassir, M.¹ Goubin, F.² Bernay, C.³ Vernoux, P.⁴ Lincot, D.⁵

20
- 9144261078
- Ed. H. Nalwa, American Scientific Publisher
- (a) S. Mathur, H. Shen in Encyclopedia of Nanoscience and Nanotechnology, Ed. H. Nalwa, American Scientific Publisher 2004, 4, 131.
- (2004) Encyclopedia of Nanoscience and Nanotechnology , vol.4 , pp. 131
- Mathur, S.¹ Shen, H.²

21
- 1842714062
- (b) S. Mathur, Chemical Physics of Thin Film Deposition -Processes for Micro- and Nano-Technologies 2002, 91.
- (2002) Chemical Physics of Thin Film Deposition -Processes for Micro- and Nano-Technologies , pp. 91
- Mathur, S.¹

22
- 0036602197
- (c) H. Shen, S. Mathur, J. Phys. IV France 2002, 12, Pr 4-1.
- (2002) J. Phys. IV France , vol.12 , pp. 4-11
- Shen, H.¹ Mathur, S.²

23
- 0000107389
- (d) M. Veith, S. Mathur, C. Mathur, Polyhedron 1998, 17, 1005.
- (1998) Polyhedron , vol.17 , pp. 1005
- Veith, M.¹ Mathur, S.² Mathur, C.³

24
- 0036189583
- (e) S. Mathur, M. Veith, H. Shen, S. Hüfner, M. Jillavi, Chem. Mater. 2002, 14, 568.
- (2002) Chem. Mater. , vol.14 , pp. 568
- Mathur, S.¹ Veith, M.² Shen, H.³ Hüfner, S.⁴ Jillavi, M.⁵

25
- 0035186896
- (f) M. Veith, S. Mathur, H. Shen, N. Lecerf, S. Hüfner, M. Jillavi, Chem. Mater. 2001, 13, 4041.
- (2001) Chem. Mater. , vol.13 , pp. 4041
- Veith, M.¹ Mathur, S.² Shen, H.³ Lecerf, N.⁴ Hüfner, S.⁵ Jillavi, M.⁶

26
- 0037010163
- (g) S. Mathur, H. Shen, N. Lecerf, A. Kjekshus, H. Fjellvag, G. F. Goya, Adv. Mater. 2002, 14, 1405.
- (2002) Adv. Mater. , vol.14 , pp. 1405
- Mathur, S.¹ Shen, H.² Lecerf, N.³ Kjekshus, A.⁴ Fjellvag, H.⁵ Goya, G.F.⁶

27
- 0000255920
- (h) M. Veith, S. Mathur, N. Lecerf, H. Shen, S. Hüfner, Chem. Mater. 1999, 11, 3103.
- (1999) Chem. Mater. , vol.11 , pp. 3103
- Veith, M.¹ Mathur, S.² Lecerf, N.³ Shen, H.⁴ Hüfner, S.⁵

28
- 0038897230
- (i) S. Mathur, M. Veith, V. Sivakov, H. Shen, V Huch, U. Hartmann, H. B. Gao, Chem. Vap. Deposition 2002, 8, 277.
- (2002) Chem. Vap. Deposition , vol.8 , pp. 277
- Mathur, S.¹ Veith, M.² Sivakov, V.³ Shen, H.⁴ Huch, V.⁵ Hartmann, U.⁶ Gao, H.B.⁷

29
- 1842779984
- (j) S. Mathur, M. Veith, T. Ruegamer, E. Hemmer, H. Shen, Chem. Mater. 2004, 16, 1304.
- (2004) Chem. Mater. , vol.16 , pp. 1304
- Mathur, S.¹ Veith, M.² Ruegamer, T.³ Hemmer, E.⁴ Shen, H.⁵

30
- 2442686704
- (k) S. Mathur, M. Veith, R. Rapalaviciute, H. Shen, G. F. Goya, W. L. Martins Filho, T. S. Berquo, Chem. Mater. 2004, 16, 1906.
- (2004) Chem. Mater. , vol.16 , pp. 1906
- Mathur, S.¹ Veith, M.² Rapalaviciute, R.³ Shen, H.⁴ Goya, G.F.⁵ Martins Filho, W.L.⁶ Berquo, T.S.⁷

31
- 2942554873
- (l) S. Mathur, H. Shen, V. Sivakov, U. Werner, Chem. Mater. 2004, 16, 2449.
- (2004) Chem. Mater. , vol.16 , pp. 2449
- Mathur, S.¹ Shen, H.² Sivakov, V.³ Werner, U.⁴

32
- 0001643341
- H. Wendel, H. Suhr, Appl. Phys. A 1992, A-54, 389.
- (1992) Appl. Phys. A , vol.A-54 , pp. 389
- Wendel, H.¹ Suhr, H.²

33
- 0028464592
- J. Si, S. B. Desu, C. Tsai, J. Mater. Res. 1994, 9, 1721.
- (1994) J. Mater. Res. , vol.9 , pp. 1721
- Si, J.¹ Desu, S.B.² Tsai, C.³

34
- 0036201801
- D. J. Burleson, J. T. Roberts, W. L. Gladfelter, S. A. Campbell, R. C. Smith, Chem. Mater. 2002, 14, 1269.
- (2002) Chem. Mater. , vol.14 , pp. 1269
- Burleson, D.J.¹ Roberts, J.T.² Gladfelter, W.L.³ Campbell, S.A.⁴ Smith, R.C.⁵

35
- 0242384954
- P. L. Franceschini, M. Morstein, H. Berke, H. W. Schmalle, Inorg. Chem. 2003, 42, 7273.
- (2003) Inorg. Chem. , vol.42 , pp. 7273
- Franceschini, P.L.¹ Morstein, M.² Berke, H.³ Schmalle, H.W.⁴

36
- 0000395209
- M. Morstein, I. Pozsgai, N. D. Spencer, Chem. Vap. Deposition 1999, 5, 151.
- (1999) Chem. Vap. Deposition , vol.5 , pp. 151
- Morstein, M.¹ Pozsgai, I.² Spencer, N.D.³

37
- 0001462550
- I. M. Thomas, Can. J. Chem. 1961, 39, 1386.
- (1961) Can. J. Chem. , vol.39 , pp. 1386
- Thomas, I.M.¹

38
- 37049042024
- D. C. Bradley, I. M. Thomas, J. Chem, Soc. 1960, 3857.
- (1960) J. Chem, Soc. , vol.3857
- Bradley, D.C.¹ Thomas, I.M.²

39
- 0004242252
- Academic Press, NY
- C. Bradley, R. C. Mehrotra, D. P. Gaur, Metal Alkoxides, Academic Press, NY, 1978.
- (1978) Metal Alkoxides
- Bradley, C.¹ Mehrotra, R.C.² Gaur, D.P.³

40
- 85066691291
- Ch. Täschner, K. Bartsch, A. Leonhardt, Surface Coatings Technol. 1993, 67, 158.
- (1993) Surface Coatings Technol. , vol.67 , pp. 158
- Täschner, Ch.¹ Bartsch, K.² Leonhardt, A.³

41
- 0003459529
- Perkin-Elmer Corp.: Eden Prairie, MN
- ESCA Handbook of X-ray Photoelectron Spectroscopy, Perkin-Elmer Corp.: Eden Prairie, MN, 1992.
- (1992) ESCA Handbook of X-ray Photoelectron Spectroscopy

42
- 0001648732
- L. Pichon, A. Straboni, T. Girardeau, M. Drouet, P. Widmayer, J. Appl. Phys. 2000, 87, 925.
- (2000) J. Appl. Phys. , vol.87 , pp. 925
- Pichon, L.¹ Straboni, A.² Girardeau, T.³ Drouet, M.⁴ Widmayer, P.⁵

43
- 33847577894
- (a) R. C. Garvie, J. Phys. Chem. Solids 1965, 69, 1238.
- (1965) J. Phys. Chem. Solids , vol.69 , pp. 1238
- Garvie, R.C.¹

44
- 85066705163
- (b) R. C. Garvie, J. Phys. Chem. Solids 1978, 82, 284.
- (1978) J. Phys. Chem. Solids , vol.82 , pp. 284
- Garvie, R.C.¹

45
- 85066711266
- T. Chraska, A. H. King, C. C. Berndt, Mater. Sci. Eng. A 2000, 286, 1568.
- (2000) Mater. Sci. Eng. A , vol.286 , pp. 1568
- Chraska, T.¹ King, A.H.² Berndt, C.C.³

46
- 10844284788
- DOI: 10.1016/j.apsusc.2004.05.278
- W. Gulbinski, S. Mathur, H. Shen, T. Suszko, A. Gilewicz, B. Warcholiński, Appl Surf. Sci. 2004 DOI: 10.1016/j.apsusc.2004.05.278.
- (2004) Appl Surf. Sci.
- Gulbinski, W.¹ Mathur, S.² Shen, H.³ Suszko, T.⁴ Gilewicz, A.⁵ Warcholiński, B.⁶

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