Development of a model for high precursor conversion efficiency pulsed-pressure chemical vapor deposition (PP-CVD) processing

Chemical Engineering Journal

Volumn 135, Issue 1-2, 2008, Pages 120-128

  Cave, Hadley M ^a   Krumdieck, Susan P ^a   Jermy, Mark C ^a  

^a UNIVERSITY OF CANTERBURY   (New Zealand)

Author keywords

Diffusion; DSMC; Precursor conversion efficiency; Process modelling; Pulsed pressure chemical vapour deposition (PP CVD)

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CORRELATION METHODS; DIFFUSION; MATHEMATICAL MODELS;

DSMC; PRECURSOR CONVERSION EFFICIENCY; PROCESS MODELING; PULSED-PRESSURE CHEMICAL VAPOUR DEPOSITION (PP-CVD);

PROCESS CONTROL;

CHEMICAL VAPOR DEPOSITION; CORRELATION METHODS; DIFFUSION; MATHEMATICAL MODELS; PROCESS CONTROL;

EID: 36049034276     PISSN: 13858947     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cej.2007.03.027     Document Type: Article

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