Fabrication of nanoporous antireflection surfaces on silicon

Solar Energy Materials and Solar Cells

Volumn 92, Issue 11, 2008, Pages 1352-1357

  Huang, Mao Jung ^a   Yang, Chii Rong ^b   Chiou, Yuang Cherng ^a   Lee, Rong Tsong ^a  

^a NATIONAL SUN YAT SEN UNIVERSITY   (Taiwan)

^b NATIONAL TAIWAN NORMAL UNIVERSITY   (Taiwan)

Author keywords

Antireflection structure; Nanopore array; PAECE; SANSL

Indexed keywords

ASPECT RATIO; CLADDING (COATING); DIRECT ENERGY CONVERSION; ETCHING; LITHOGRAPHY; NANOSTRUCTURED MATERIALS; NANOSTRUCTURES; NITRIDES; NONMETALS; OPTICAL DESIGN; PHOTORESISTS; PHOTOVOLTAIC CELLS; POWER GENERATION; PRESSURE DROP; REFLECTION; SILICON; SILICON NITRIDE; SOLAR CELLS; SOLAR ENERGY; SOLAR EQUIPMENT;

ANTI-REFLECTION; ANTIREFLECTION STRUCTURE; ANTIREFLECTION SURFACES; ARRAY STRUCTURES; ETCHING DEPTH; FABRICATION TECHNOLOGIES; HIGH ASPECT RATIO; LOW COSTS; NANO PORES; NANO STRUCTURING; NANO-POROUS; NANOPORE ARRAY; NANOSPHERE LITHOGRAPHY; NITRIDE LAYERS; PAECE; POWER GENERATION EFFICIENCY; SANSL; SELF-ASSEMBLED; SILICON-BASED; SINGLE CRYSTALLINE SILICON; WAFER SURFACES; WAVELENGTH RANGES;

SILICON WAFERS;

EID: 50249086870     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2008.05.014     Document Type: Article

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