Fabrication of silicon-based two-dimensional photonic crystals

Microsystem Technologies

Volumn 12, Issue 10-11, 2006, Pages 919-922

  Zhu, Jian ^a,b   Zhang, Yong ^b   Zhou, Bailing ^a   Gao, Jianfeng ^b   Jia, Shixing ^b  

^a SOUTHEAST UNIVERSITY   (China)

^b NANJING ELECTRONIC DEVICES INSTITUTE   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; ETCHING; INDUCTIVELY COUPLED PLASMA; LATTICE CONSTANTS; PHOTONS; SILICON;

MASK MAKING; PHOTONIC CRYSTALS;

CRYSTALS;

EID: 33747604823     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-006-0123-1     Document Type: Conference Paper

References (5)

1. Charlton MDB, Roberts SW, Paker GJ (1997) Guided mode analysis, and fabrication of a 2-dimensional visible photonic band structure confined within a planar semiconductor wave-guide. Mater Sei Eng B-115 Solid State Mater Adv Technol 49:155-165
2. John S (1987) Strong localization of photons in certain disordered dielectric superlattices. Phys Rev Lett 58:2486
3. Standaert TEFM, Schaepkens M, Rueger NR et al (2002) High density fluorocarbon etching of silicon in an inductively coupled plasma: Mechanism of etching through a thick steady state fluorocarbon layer [J]. J Vac Sei Technol A 20(4):239-249
4. Villeneuve PR, Johnson SG, Joannopoulos JD (1999) Three-dimensional photon. Confinement in photonic crystals of lowdimensional periodicity. IEE Proc 183 Optpelectron 145:384
5. Yablonovitch E (1987) Inhibited spontaneous emission in solid-state physics and electronics. Phys Rev Lett 58:2059