Fabrication of two-dimensional photonic crystal waveguides for 1.5 μm in silicon by deep anisotropic dry etching

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 2734-2739

  Zijlstra, T ^a   Van Der Drift, E ^a   De Dood, M J A ^b   Snoeks, E ^b   Polman, A ^b  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b FOM INSTITUTE AMOLF   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033268561     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591054     Document Type: Article

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