Fabrication of photonic crystals in silicon-on-insulator using 248-nm deep UV lithography

IEEE Journal on Selected Topics in Quantum Electronics

Volumn 8, Issue 4, 2002, Pages 928-934

  Bogaerts, Wim ^a,b   Wiaux, Vincent ^c   Taillaert, Dirk ^a,b   Beckx, Stephan ^c   Luyssaert, Bert ^a,b   Bienstman, Peter ^a,d   Baets, Roel ^a,b  

^a IEEE   (Belgium)

^b GHENT UNIVERSITY   (Belgium)

^c IMEC   (Belgium)

^d MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Integrated optics; Lithography; Nanotechnology

Indexed keywords

DEEP ULTRAVIOLET LITHOGRAPHY; PHOTONIC CRYSTAL; PHOTONIC INTEGRATED CIRCUIT; THREE-DIMENSIONAL PERIODIC STRUCTURE;

CMOS INTEGRATED CIRCUITS; CRYSTALS; ELECTRON BEAM LITHOGRAPHY; INTEGRATED OPTICS; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; OPTICAL WAVEGUIDES; PHOTOLITHOGRAPHY; REFRACTIVE INDEX; SILICON ON INSULATOR TECHNOLOGY;

INTEGRATED OPTOELECTRONICS;

EID: 0036661974     PISSN: 1077260X     EISSN: None     Source Type: Journal    
DOI: 10.1109/JSTQE.2002.800845     Document Type: Article

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