Measuring power distribution system resistance variations

IEEE Transactions on Semiconductor Manufacturing

Volumn 21, Issue 3, 2008, Pages 444-453

  Helinski, Ryan ^b   Plusquellic, Jim ^a,b  

^a IEEE

^b University of New Mexico   (United States)

Author keywords

Power distribution system; Process variation; Resistance variations

Indexed keywords

ELECTRIC LOAD DISTRIBUTION; ELECTRIC POWER SYSTEMS; INTEGRATED CIRCUIT MANUFACTURE; METALS; NETWORKS (CIRCUITS); OPTICAL DESIGN; TESTING;

BACK-END OF LINE; CIRCUIT DESIGNS; DISTRIBUTED RESOURCE; METAL RESISTANCES; ON CHIPS; POWER DISTRIBUTION SYSTEM; PROCESS VARIATION; RESISTANCE VARIATIONS; SIMPLE METHODS; SIMULTANEOUS EQUATIONS; TEST CHIPS;

ELECTRIC POWER DISTRIBUTION;

EID: 49249126959     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2008.2001222     Document Type: Conference Paper

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