Stress-aware design methodology

Proceedings - International Symposium on Quality Electronic Design, ISQED

Volumn , Issue , 2006, Pages 807-812

  Moroz, Victor ^a   Smith, Lee ^a   Lin, Xi Wei ^a   Pramanik, Dipu ^a   Rollins, Greg ^a  

^a SYNOPSYS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

45NM TECHNOLOGY; DESIGN METHODOLOGY; MECHANICAL STRESS; NONUNIFORM STRESS DISTRIBUTION; PERFORMANCE VARIATIONS; SHALLOW TRENCH ISOLATION; SOURCE AND DRAINS; TRANSISTOR PERFORMANCE;

CMOS INTEGRATED CIRCUITS; DESIGN;

STRESSES;

EID: 84886740677     PISSN: 19483287     EISSN: 19483295     Source Type: Conference Proceeding    
DOI: 10.1109/ISQED.2006.124     Document Type: Conference Paper

References (9)

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