Improved insight in charge trapping of high-k ZrO2/SiO 2 stacks by use of tunneling atomic force microscopy

Journal of Applied Physics

Volumn 104, Issue 2, 2008, Pages

  Paskaleva, A ^a   Yanev, V ^b   Rommel, M ^b   Lemberger, M ^b   Bauer, A J ^b  

^a INSTITUTE OF SOLID STATE PHYSICS   (Bulgaria)

^b FRAUNHOFER INSTITUTE FOR INTEGRATED SYSTEMS AND DEVICE TECHNOLOGY IISB   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; IMAGING TECHNIQUES; MICROSCOPIC EXAMINATION; SCANNING PROBE MICROSCOPY; ZIRCONIUM ALLOYS;

CHARGE TRAPPING;

EID: 48849109675     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2957072     Document Type: Article

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