Characterization of high nitrogen content-amorphous carbon nitride films using NEXAFS spectroscopy

Diamond and Related Materials

Volumn 17, Issue 7-10, 2008, Pages 1755-1758

  Kanda, Kazuhiro ^a   Igaki, Jun ya ^a   Kometani, Reo ^a   Matsui, Shinji ^a   Ito, Haruhiko ^b  

^a UNIVERSITY OF HYOGO   (Japan)

^b NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

Carbon nitride film; Near edge X ray absorption fine structure; Plasma enhanced chemical vapor deposition; Synchrotron radiation

Indexed keywords

ABSORPTION; AMORPHOUS CARBON; AMORPHOUS FILMS; CARBON; CARBON FILMS; NITRIDES; NITROGEN; NONMETALS; X RAY ABSORPTION NEAR EDGE STRUCTURE SPECTROSCOPY;

AMORPHOUS CARBON NITRIDE; AMORPHOUS CARBON NITRIDE FILMS; CARBON K-EDGE; CARBON NITRIDE FILM; HIGH NITROGEN CONTENT; NEAR-EDGE X-RAY ABSORPTION FINE STRUCTURE; NEAR-EDGE X-RAY ABSORPTION FINE STRUCTURE SPECTRA; NEXAFS SPECTROSCOPY; PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION; SYNCHROTRON RADIATION;

CARBON NITRIDE;

EID: 48849094647     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2008.01.064     Document Type: Article

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