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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 5 A, 2002, Pages 3130-3136

Ion-induced processes in the dissociative excitation reaction of BrCN to synthesize mechanically hard amorphous carbon nitride films in the microwave plasma chemical vapor deposition system

(6) Ito, Haruhiko a Tanaka, Kazuhiro a Sato, Akira a Ito, Noriko a Ohkawara, Yoshiaki a Saitoh, Hidetoshi a

a NAGAOKA UNIVERSITY OF TECHNOLOGY (Japan)

Author keywords

Amorphous CNx films; BrCN; Chemical vapor deposition; CN radical; Dissociative excitation; Microwave plasma; Optical emission spectroscopy; RF bias

Indexed keywords

BROMINE COMPOUNDS; CARBON NITRIDE; ELECTRIC POTENTIAL; EMISSION SPECTROSCOPY; ENERGY TRANSFER; HARDNESS; ION BOMBARDMENT; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POSITIVE IONS; RESONANCE; SYNTHESIS (CHEMICAL);

DISSOCIATIVE EXCITATION REACTION; ION-INDUCED PROCESSES;

AMORPHOUS FILMS;

EID: 0036578252 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.41.3130 Document Type: Article

Times cited : (21)

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