Synthesis and characterization of amorphous carbon nitride films

Thin Solid Films

Volumn 290-291, Issue , 1996, Pages 94-98

  Holloway, B C ^a   Shuh, D K ^b   Kelly, M A ^a   Tong, W ^b   Carlisle, J A ^c   Jimenez, I ^c   Sutherland, D G J ^c   Terminello, L J ^c   Pianetta, P ^a   Hagstrom, S ^a  

^a STANFORD UNIVERSITY   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^c LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

Amorphous films; Carbon nitride; Near edge X ray absorption fine structure (NEXAFS); X ray photoelectron spectroscopy

Indexed keywords

CARBON INORGANIC COMPOUNDS; CHEMICAL VAPOR DEPOSITION; ELECTRON ENERGY LEVELS; FILM GROWTH; GLOW DISCHARGES; MORPHOLOGY; SCANNING ELECTRON MICROSCOPY; STOICHIOMETRY; SUBSTRATES; SYNTHESIS (CHEMICAL); THERMAL EFFECTS; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON NITRIDE;

AMORPHOUS FILMS;

EID: 0040262800     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)09203-6     Document Type: Article

References (20)

1. J.J. Cuomo, P.A. Leary, D. Yu, W. Reuter and M. Frisch, J. Vac. Sci. Technol. A, 16 (1979) 299-302.
2. A.Y. Liu and M.L. Cohen, Phys. Rev. B, 41 (1990) 10727-10734.
3. K.M. Yu, M.L. Cohen, E.E. Haller, W.L. Hansen, A.Y. Liu and I.C. Wu, Phys. Rev. B, 49 (1994) 5034-5037.
4. C. Niu, Y.Z. Lu and C.M. Lieber, Science, 261 (1993) 334-337.
5. E.C. Cutiongco, D. Li, Y.-W. Chung and C.S. Bhatia, Tribological behavior of amorphous carbon nitride overcoats for magnetic thin-film rigid disks. In P.A. Sutor (ed.), STLE/ASME Tribology Conf., Orlando, FL, ASME, 1995, New York, NY, p. 1.
6. M.Y. Chen, X. Lin, V.P. Dravid and Y.W. Chung, Surf. Coat. Technol., 54-55 (1992) 360-364.
7. D. Marton, K.J. Boyd, A.H. Al-Bayati, S.S. Todorov and J.W. Rabalais, Phys. Rev. Lett., 73 (1994) 118-121.
8. K. Ogata, J. Fernando Diniz Chubaci and F. Fujimoto, J. Appl. Phys., 76 (1994) 3791-3796.
9. D. Li, C. Yip-Wah, W. Ming-Show and W.D. Sproul, J. Appl. Phys., 74 (1993) 219-233.
10. S.S. Todorov, D. Marton, K.J. Boyd, A.H. Al-Bayati and J.W. Rabalais, J. Vac. Sci. Technol. A, 12 (1994) 3192-3199.
11. H.W. Song, F.Z. Cui, X.M. He, W.Z. Li and H.D. Li, J. Phys.: Condens. Matter, 6 (1994) 6125-6129.
12. P.A. Flinn and G.A. Waychunas, J. Vac. Sci. Technol. B, 6 (1988) 1749-1755.
13. J.E. Klemberg-Sapieha, O.M. Kuttel, L. Martinu and M.R. Wertheimer, J. Vac. Sci. Technol. A, 9 (1991) 2975.
14. L.J. Terminello, A. Chaiken, D.A. Lapiano-Smith, G.L. Doll and T. Sato, J. Vac. Sci. Technol. A, 12 (1994) 2.
15. Y. Guo and W.A. Goddard III, Chem. Phys. Lett., 237 (1995) 72-76.
16. F. Rossi et al., J. Mater. Res., 9 (1994) 2440-2449.
17. S.N. Kumar, F. Gaillard, G. Bouyssoux and A. Sartre, Synth. Met., 36 (1990) 111-127.
18. M.A. Kelly, D.S. Olson, S. Kapoor and S.B. Hagstrom, Appl. Phys. Lett., 60 (1992) 2502-2504.
19. S. Kumar and T.L. Tansley, J. Appl. Phys., 76 (1994) 4390-4392.
20. J.A. Thorton, J. Vac. Sci. Technol. A, 4 (1986) 3059-3065.