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Volumn 15, Issue 3, 2005, Pages 123-129

Characterization of amorphous carbon nitride films formed by plasma-enhanced chemical vapor deposition of CN radicals using C K-edge X-ray absorption fine structure spectroscopy

Author keywords

Carbon nitride film; Near edge X ray absorption fine structure; Plasma enhanced chemical vapor deposition; Synchrotron radiation

Indexed keywords

ABSORPTION; CHARACTERIZATION; CHEMICAL VAPOR DEPOSITION; FREE RADICALS; PLASMAS; PROBES; SYNCHROTRONS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY; X RAYS;

EID: 23844551943     PISSN: 13449931     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper
Times cited : (5)

References (30)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.