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Volumn 39, Issue 7 A, 2000, Pages 4148-4152
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Hardness and structure of a-CNx films synthesized by chemical vapor deposition
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Author keywords
Carbon nitride; Chemical vapor deposition; Creep; Elastic recovery; FTIR; Hardness; Ion bombardment; Microwave plasma; Nano indentation; Young's modulus
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Indexed keywords
ABSORPTION;
ABSORPTION SPECTROSCOPY;
BAND STRUCTURE;
CARBON INORGANIC COMPOUNDS;
CHEMICAL BONDS;
CHEMICAL VAPOR DEPOSITION;
DISSOCIATION;
ELASTIC MODULI;
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
HARDNESS;
ION BOMBARDMENT;
SYNTHESIS (CHEMICAL);
CARBON NITRIDE FILMS;
DISSOCIATIVE EXCITATION REACTION;
ELASTIC RECOVERY;
INFRARED ABSORPTION SPECTRUM;
NANOINDENTATION TESTS;
AMORPHOUS FILMS;
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EID: 0034215922
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.39.4148 Document Type: Article |
Times cited : (38)
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References (12)
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