Investigations on electrical properties of a-C:H thin films deposited in a Microwave Multipolar Plasma reactor excited at Distributed Electron Cyclotron Resonance

Diamond and Related Materials

Volumn 17, Issue 7-10, 2008, Pages 1710-1715

  Kihel, M ^a   Clergereaux, R ^b   Escaich, D ^b   Calafat, M ^b   Raynaud, P ^b   Sahli, S ^a   Segui, Y ^b  

^a Universite Mentouri Constantine   (Algeria)

^b Laboratoire Plasma et Conversion d'Energie   (France)

Author keywords

Amorphous hydrogenated carbon; Electrical conductivity; Electrical properties characterization; Plasma CVD

Indexed keywords

AMORPHOUS CARBON; AMORPHOUS FILMS; CARBON FILMS; CHEMICAL PROPERTIES; CYCLOTRON RESONANCE; CYCLOTRONS; DISCHARGE (FLUID MECHANICS); ELECTRIC PROPERTIES; ELECTRON CYCLOTRON RESONANCE; FLUID MECHANICS; MAGNETISM; METHANE; MICROWAVES; MOLECULAR BEAM EPITAXY; PARTICLE ACCELERATORS; PLASMA APPLICATIONS; PLASMA DIAGNOSTICS; PLASMAS; RESONANCE; THICK FILMS; THIN FILMS;

AMORPHOUS HYDROGENATED CARBON; DISTRIBUTED ELECTRON CYCLOTRON RESONANCE; ELECTRICAL CONDUCTIVITY; ELECTRICAL PROPERTIES; ELECTRICAL PROPERTIES CHARACTERIZATION; FILM DENSITY; PHYSICO CHEMICALS; PLASMA CVD; PLASMA DISCHARGES; PLASMA REACTORS; PROCESS PARAMETERS;

ELECTRIC DISCHARGES;

EID: 48849093285     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2008.01.036     Document Type: Article

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