Effects of density and bonding structure on dielectric constant of plasma deposited a-C:H films

Diamond and Related Materials

Volumn 14, Issue 3-7, 2005, Pages 1000-1004

  Louh, S P ^a   Leu, I C ^b   Hon, M H ^a,c  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^b KUN SHAN UNIVERSITY   (Taiwan)

^c DA YEH UNIVERSITY   (Taiwan)

Author keywords

Amorphous hydrogenated carbon; Electrical property characterization; PECVD

Indexed keywords

CARBON; CHEMICAL BONDS; ELECTRIC RESISTANCE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROCARBONS; HYDROGENATION; LEAKAGE CURRENTS; PERMITTIVITY; RAMAN SPECTROSCOPY;

A-C:H FILMS; AMORPHOUS HYDROGENATED CARBON; ELECTRICAL PROPERTY CHARACTERIZATION; PECVD;

AMORPHOUS FILMS;

EID: 18444402240     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2004.12.004     Document Type: Conference Paper

References (27)

1. K. Buchanan, P. Sermon, and P. Siblerud Solid State Technology 2003 (August) 34
2. P. Singer Semiconductor International 2003 (March) 32
3. L. Peters Semiconductor International 2000 (June) 108
4. D.J. Thomas, Y.P. Song, and K. Powell Solid State Technology 2001 (March) 107
5. K.H. Block, and H.L. Rayle Semiconductor International 2002 (June) 115
6. A. Grill Diamond and Related Materials 10 2001 234
7. Z.R. Song, Y.H. Yu, C.L. Li, S.C. Zou, F.M. Zhang, X. Wang, D.S. Shen, E.Z. Luo, B. Sundaravel, S.P. Wang, and I.H. Wilson Applied Physics Letters 80 5 2002 743
8. M. Morgen, E.T. Ryan, J.H. Zhao, C. Hu, T. Cho, and P.S. Ho Annual Review of Materials Science 30 2000 645
9. M.C. Kim, S.H. Cho, S.B. Lee, Y. Kim, and J.H. Boo Thin Solid Films 447-448 2004 592
10. L. Peters Semiconductor International 2002 (January) 21
11. K. Endo, and T. Tatsumi Applied Physics Letters 70 19 1997 2616
12. J. Yang, C. Shin, and D. Jung Chemical Vapor Deposition 8 1 2002 35
13. J. Yang, C. Shin, and D. Jung Japanese Journal of Applied Physics 39 2000 L1324
14. M. Veres, M. Koos, and I. Pocsik Diamond and Related Materials 11 3-6 2002 1110
15. K. Maex, M.R. Baklanov, D. Shamiryan, F. Iacopi, S.H. Brongersma, and Z.S. Yanovitskaya Journal of Applied Physics 93 11 2003 8793
16. S.M. Han, and E.S. Aydil Journal of Applied Physics 83 1998 2172
17. C. Himcinschi, M. Friedrich, S. Fruhaul, S.E. Schulz, T. Gessner, and D.R.T. Zahn Thin Solid Films 455-456 2004 433
18. K. Endo, K. Shinoda, and T. Tatsumi Journal of Applied Physics 86 5 1999 2739
19. T. Heitz, C. Godet, J.E. Bouree, and B. Drevillon Physical Review. B 60 8 1999 6045
20. M. Koos, M. Veres, M. Fule, and I. Pocsik Diamond and Related Materials 11 1 2002 53
21. S.W. Lim, Y. Shimogaki, Y. Nakano, K. Tada, and H. Komiyama Japanese Journal of Applied Physics 35 1996 1468
22. G.R. Flowles, H.B. Hollinger, J. Grebowicz, and B. Wunderlich Macromolecules 27 16 1990 3855
23. Q. Wu, and K.K. Gleason Journal of Vacuum Science and Technology A 21 2 2003 388
24. K. Endo, and T. Tatsumi Journal of Applied Physics 78 1995 1370
25. Y.H. Kim, S.K. Lee, and H.J. Kim Journal of Vacuum Science and Technology A 18 4 2000 1216
26. J.G. Grasselli, and B.J. Bulkin Analytical raman spectroscopy 1991 John Wiley & Sons Canada 5
27. A. Grill Journal of Applied Physics 94 10 2003 6697