Effects of the methane content on the characteristics of diamond-like carbon films produced by sputtering

Thin Solid Films

Volumn 373, Issue 1-2, 2000, Pages 243-246

  Mansano, R D ^a   Massi, M ^a   Zambom, L S ^b   Verdonck, P ^a   Nogueira, P M ^a   MacIel, H S ^c   Otani, C ^c  

^a UNIVERSITY OF SÃO PAULO   (Brazil)

^b FACULDADE DE TECNOLOGIA DE SÃO PAULO   (Brazil)

^c INSTITUTO TECNOLÓGICO DE AERONÁUTICA   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CARBON; METHANE; PERMITTIVITY; SPUTTER DEPOSITION; SURFACE ROUGHNESS;

AMORPHOUS HYDROGENATED CARBON;

DIAMOND FILMS;

EID: 0034262663     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01088-9     Document Type: Article

References (12)

1. Tsai H.-C., Bogy D.B. J. Vac. Sci. Technol. A. 5:1987;3287.
2. Grill A. Diamond Relat. Mater. 8:1999;428.
3. Lifshitz Y. Diamond Relat. Mater. 5:1996;388.
4. Robertson J. Amorphous carbon. Adv. Phys. 35:1986;317.
5. Grill A., Meyerson B.S. Synthetic diamond: emerging CVD science and technnology. 1994;John Wiley & Sons Inc, USA.
6. Peters L. Semicond. Int. 22(1):1999;46.
7. Teii K. Thin Solid Films. 333:1998;103.
8. Massi M., Mansano R.D., Maciel H.S., Otani C., Verdonck P., Nishioka l.N.B.N. Thin Solid Films. 343/344:1999;378.
9. Clarke G.A., Xie Y., Eldridge J.E., Parsons R.R. Thin Solid Films. 280:1996;130.
10. Peng X.L., Clyne T.W. Thin Solid Films. 312:1998;207.
11. Paterson M.J. Diamond Relat. Mater. 7:1998;908.
12. Khan A., Woollam J.A., Chung Y. Solid State Electron. 27:1984;385.