Very low dielectric constants of diamond-like carbon films deposited on ground electrode by plasma-enhanced chemical vapor deposition

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 2 A, 2006, Pages 860-867

  Yokota, Katsuhiro ^a   Miyoshi, Yuuya ^a   Saoyama, Masaki ^a  

^a KANSAI UNIVERSITY   (Japan)

Author keywords

Diamond like carbon; Dielectric constant; Plasma enhanced CVD

Indexed keywords

CARBON; CHEMICAL VAPOR DEPOSITION; DIAMONDS; ELECTRIC POTENTIAL; METHANE; PERMITTIVITY;

DIAMOND-LIKE CARBON; ELECTRICAL CONDUCTIVITY; PLASMA-ENHANCED CVD; POOLE-FRENKEL MECHANISM;

THIN FILMS;

EID: 32244433435     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.860     Document Type: Article

References (24)

1. M. Borhr and Y. A. Elmansy: IEEE Trans. Electron Devices 45 (1998) 620.
2. The International Technology Roadmap for Semiconductors, 2004 Update, http://public.itrs.net Update/Home.pdf.
3. H. Treichel, B. Withers, G. Ruhl, P. Ansmann, R. Wurl, C. Muller, M. Dietlmeier and G. Maier: in Handbook of Low and High Dielectric Constant Materials and Their Applications, ed. H. S. Nalwa (Academic, San Diego, 1999).
4. A. Lettington: in Thin Film Diamond, ed. A. Lettington and J. W. Steeds (Chapman, London, 1994) p. 117.
5. J. L. Vossen: J. Electrochem. Soc. 126 (1979) 319.
6. A. Bubenzer, B. Dischler, G. Brandt and P. J. Koidl: Appl. Phys. 54 (1983) 4590.
7. L. Martinu, A. Raveh, A. Domingue, L. Bertand, J. E. Elemberg-Sapieha, S. C. Gujrathi and M. R. Wertheimer: Thin Solid Films 208 (1992) 42.
8. A. Grill, V. Patel, K. L. Saenger, C. Jahnes, S. A. Cohen, A. G. Schrott, D. C. Edelstein and J. R. Paraszczak: Mater. Res. Soc. Symp. Proc. 443 (1997) 155.
9. J. Damasceno, S. S. Camargo and M. Cremoma: J. Mater. Res. 6 (2002) 19.
10. M. Tolan: X-Ray Scattering from Soft-Matter Thin Films (Springer, Berlin, 1999) Chap. 1.
11. R. K. Sampson and H. Z. Massoud: J. Electrochem. Soc. 140 (1993) 2673.
12. K. Endo and Y. Matsubara: Low-k Amorphous Carbon Films for Interconnects of Submicron-Scale Devices in Handbook of Low and High Dielectric Constants and Their Applications, ed. H. S. Nalwa (Academic, San Diego, 1999).
13. K.-P. Kuo and J. Asmussen: Diamond Relat. Mater. 6 (1997) 1097.
14. J. Robertson: in Thin Film Diamond, ed. A. Lettington and J. W. Steeds (Chapman, London, 1994) p. 107.
15. S. M. Sze: Semiconductor Devices Physics and Technology (Wiley, New York, 1985) Chap. 5.
16. A. Chelkowski: Dielectric Physics (Elsevier, Amsterdam, 1979) Chap. 4.
17. B. El-Kareh: Fundamentals of Semiconductor Processing Technologies (Kluwer, Boston, 1995) Chap. 2.
18. A. J. Dekker: Solid State Physics (Prentick, New York, 1957) Chap. 7.
19. Y. Ooki: Yudentai Bussei (Baifukan, Tokyo, 2002) Chap. 3 [in Japanese].
20. Joint Committee for Powder Diffraction Standards, Powder Diffraction File, Int. Center for Diffraction Data, Park lane, No. 6-0675.
21. Joint Committee for Powder Diffraction Standards, Powder Diffraction File, Int. Center for Diffraction Data, Park lane, No. 17-901.
22. D. R. Lide: Handbook of Chemistry and Physics (CRC, Boca Raton, 1999-2000) 80th ed., p. 12-207.
23. S. M. Sze: Physics of Semiconductor Devices (Wiley, New York, 1981) 2nd ed., Chap. 7.
24. D. K. Schroder: Semiconductor Material and Device Characterization (Wiley, New York, 1998) Chap. 6.