Dielectric properties of RF plasma-deposited a-C:H and a-C:H:N films

Diamond and Related Materials

Volumn 9, Issue 3, 2000, Pages 801-804

  Romanko, L A ^a   Gontar, A G ^a   Kutsay, A M ^a   Khandozko, S I ^a   Gorokhov, V Yu ^a  

^a BAKUL INSTITUTE FOR SUPERHARD MATERIALS   (Ukraine)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC DISCHARGES; NITROGEN; PERMITTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

DIAMOND-LIKE CARBON (DLC) FILMS;

AMORPHOUS FILMS;

EID: 0033729801     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(99)00208-3     Document Type: Article

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