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Volumn 10, Issue 2, 2001, Pages 234-239
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Amorphous carbon based materials as the interconnect dielectric in ULSI chips
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Author keywords
Amorphous carbon; Dielectric; DLC; ULSI chips
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Indexed keywords
CARBON;
DIELECTRIC MATERIALS;
ELECTRIC CONDUCTIVITY OF SOLIDS;
METALLIZING;
MICROPROCESSOR CHIPS;
PERMITTIVITY;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
THERMODYNAMIC STABILITY;
ULSI CIRCUITS;
AMORPHOUS CARBON;
DIAMOND LIKE CARBON FILMS;
INTERCONNECT METALLIZATION;
AMORPHOUS FILMS;
CARBON;
DIELECTRIC PROPERTY;
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EID: 0035248170
PISSN: 09259635
EISSN: None
Source Type: Journal
DOI: 10.1016/S0925-9635(00)00473-8 Document Type: Article |
Times cited : (81)
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References (18)
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