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Diamond and Related Materials

Volumn 6, Issue 5-7, 1997, Pages 542-546

Effect of negative bias voltage on a-C:H films deposited in electron cyclotron resonance plasma

(5) Zarrabian, M a Fourches Coulon, N a Turban, G a Lancin, M a Marhic, C a

a INSTITUT DES MATÉRIAUX JEAN ROUXEL (France)

Author keywords

DLC; ECR plasma; EELS; Microstructure

Indexed keywords

EID: 0001168309 PISSN: 09259635 EISSN: None Source Type: Journal
DOI: 10.1016/s0925-9635(96)00714-5 Document Type: Article

Times cited : (72)

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