Plasma deposition of carbon layer: Correlations between plasma parameters, film structure and properties

Diamond and Related Materials

Volumn 15, Issue 4-8, 2006, Pages 888-892

  Clergereaux, R ^a   Escaich, D ^a   Savin de Larclause, I ^a   Bernecker, B ^a   Raynaud, P ^a  

^a Laboratoire Plasma et Conversion d'Energie   (France)

Author keywords

Amorphous hydrogenated carbon; Film structure and properties characterization; In situ diagnostic; Plasma CVD

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CORRELATION METHODS; HYDROGENATION; MICROWAVES; PLASMA APPLICATIONS; PRESSURE EFFECTS;

AMORPHOUS HYDROGENATED CARBON; FILM STRUCTURE AND PROPERTIES CHARACTERIZATION; IN SITU DIAGNOSTIC; PLASMA CVD;

DIELECTRIC FILMS;

EID: 33745288527     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2005.10.028     Document Type: Article

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