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Volumn 10, Issue 8, 2008, Pages 1231-1240

Hybrid approaches to nanometer-scale patterning: Exploiting tailored intermolecular interactions

Author keywords

Chemical patterning; Future science challenges; Intermolecular interactions; Nanolithography; Self assembly; Soft lithography

Indexed keywords

LITHOGRAPHY;

EID: 48749110237     PISSN: 13880764     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11051-008-9395-y     Document Type: Review
Times cited : (18)

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