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33846862714
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Bain, C. D. Ph.D. Thesis, Harvard University, 1988.
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Bain, C. D. Ph.D. Thesis, Harvard University, 1988.
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22
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0141888178
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Allara, D.L.8
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23
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33846889135
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2 is added was found to be a critical step since unremoved Cu ions can result in additional binding of admolecules in the form of Cu-thiol clusters at the surface, which leads to highly irreproducible results.
-
2 is added was found to be a critical step since unremoved Cu ions can result in additional binding of admolecules in the form of Cu-thiol clusters at the surface, which leads to highly irreproducible results.
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24
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0002368079
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Shi, J.; Hong, B.; Parikh, A. N.; Collins, R. W.; Allara, D. L. Chem. Phys. Lett. 1995, 246 (1-2). 90-94. Given that other approximations were required, e.g., the refractive index of the Cu-SAM interfaces (see refs 25 and 26), the use of an isotropic chain model, as opposed to a more accurate anisotropic chain model, seemed appropriate.
-
Shi, J.; Hong, B.; Parikh, A. N.; Collins, R. W.; Allara, D. L. Chem. Phys. Lett. 1995, 246 (1-2). 90-94. Given that other approximations were required, e.g., the refractive index of the Cu-SAM interfaces (see refs 25 and 26), the use of an isotropic chain model, as opposed to a more accurate anisotropic chain model, seemed appropriate.
-
-
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25
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33846867523
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Parikh, A. N.; Allara, D. L. Effects of Optical Anisotropy on Spectro-Ellipsometric Data for Thin Films and Surfaces. In Optical Studies on Real Surfaces and Inhomogeneous Thin Films; Francombe, M., Ed.; Physics of Thin Films Series; Academic Press: New York, 1994; 19, pp 279-323.
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Parikh, A. N.; Allara, D. L. Effects of Optical Anisotropy on Spectro-Ellipsometric Data for Thin Films and Surfaces. In Optical Studies on Real Surfaces and Inhomogeneous Thin Films; Francombe, M., Ed.; Physics of Thin Films Series; Academic Press: New York, 1994; Vol. 19, pp 279-323.
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-
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26
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33846891620
-
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3)), ∼1.8; marshite (CuI), ∼2.3; nantokite (CuCl). ∼1.9.
-
3)), ∼1.8; marshite (CuI), ∼2.3; nantokite (CuCl). ∼1.9.
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29
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33751390879
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Laibinis, P. E.; Nuzzo, R. G.; Whitesides, G. M. J. Phys. Chem. 1992, 96, 5097-5105
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Laibinis, P.E.1
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Whitesides, G.M.3
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12044259920
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Xu, C. J.; Sun, L.; Kepley, L. J.; Crooks, R. M.; Ricco. A. J. Anal. Chem. 1993, 65, 2102-2107.
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, vol.65
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Xu, C.J.1
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32
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14544291510
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Snyder, R. G.; S. L. Hsu S. L.; Krimm S. Spectrochim. Acta. A 1978, 34, 395-406.
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Snyder, R. G.; S. L. Hsu S. L.; Krimm S. Spectrochim. Acta. A 1978, 34, 395-406.
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34
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0003459529
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Moulder J. F, Ed, Perkin-Elmer Corp, Eden Prairie, MN
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Moulder J. F., Ed.; Handbook of X-ray photoelectron spectroscopy; Perkin-Elmer Corp.: Eden Prairie, MN, 1992.
-
(1992)
Handbook of X-ray photoelectron spectroscopy
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-
-
36
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33846854012
-
-
The thicknesses for all simulations are based on the SWE measurements taken for each film. A refractive index of 1.48 was used for the organic layers.
-
The thicknesses for all simulations are based on the SWE measurements taken for each film. A refractive index of 1.48 was used for the organic layers.
-
-
-
-
38
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33846891621
-
-
This period gave minimum frequency positions of the d+ and d- modes (indicating a maximum point of the degree of conformational ordering) and good surface cleanliness. Longer times showed constant conformational ordering but resulted in increasing surface contamination, likely in part from the formation of surface dimers by physisorption of solute MHA molecules to the surface CO2H groups
-
2H groups.
-
-
-
-
39
-
-
33846862493
-
-
We note that, relative to the MHA SAMs, the MPA SAMs needed to be cleaned much more thoroughly to produce a constant surface and were more difficult to keep clean
-
We note that, relative to the MHA SAMs, the MPA SAMs needed to be cleaned much more thoroughly to produce a constant surface and were more difficult to keep clean.
-
-
-
-
40
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-
0029373495
-
-
Konstadinidis, K.; Zhang, P.; Opila, R. L.; Allara, D. L. Surf. Sci. 1995, 338, 300-312.
-
(1995)
Surf. Sci
, vol.338
, pp. 300-312
-
-
Konstadinidis, K.1
Zhang, P.2
Opila, R.L.3
Allara, D.L.4
-
41
-
-
33846885043
-
-
2H C Is peaks at 284.7 and 289.4 eV. respectively. Addition of copper ions (Figure 7B) causes respective shifts of -0.9 and -0.3 eV. These types of shifts have been noted for similar surfaces and have been attributed to surface charging (see refs 8, 9, and 42).
-
2H C Is peaks at 284.7 and 289.4 eV. respectively. Addition of copper ions (Figure 7B) causes respective shifts of -0.9 and -0.3 eV. These types of shifts have been noted for similar surfaces and have been attributed to surface charging (see refs 8, 9, and 42).
-
-
-
-
42
-
-
33846855833
-
-
For general information on charging effects observed in XPS see: Briggs, D.; Grant J. T. Surface Analysis by Auger and X-Ray Photoelectron Spectroscopy; IM Publications and Surface S pectra Ltd.: West Sussex, U.K., 2003.
-
For general information on charging effects observed in XPS see: Briggs, D.; Grant J. T. Surface Analysis by Auger and X-Ray Photoelectron Spectroscopy; IM Publications and Surface S pectra Ltd.: West Sussex, U.K., 2003.
-
-
-
-
44
-
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33846859369
-
-
Experiments with deuterated MH show that the MH molecules increasingly begin inserting into the MHA underlayer for increasingly longer solution deposition periods above 30 min. This process in turn reduces the number of copper coordination sites and eventually leads to poorly structured bilayers. To minimize insertion, very short solution depositions are needed with 30 min optimum for completely reducing the Cu(II) while avoiding interlayer exchange
-
Experiments with deuterated MH show that the MH molecules increasingly begin inserting into the MHA underlayer for increasingly longer solution deposition periods above 30 min. This process in turn reduces the number of copper coordination sites and eventually leads to poorly structured bilayers. To minimize insertion, very short solution depositions are needed with 30 min optimum for completely reducing the Cu(II) while avoiding interlayer exchange.
-
-
-
-
45
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-
1942481178
-
-
Bain, C. D.; Troughton, E. B.; Tao, Y. T.; Evall, J.; Whitesides, G. M.; Nuzzo, R. G. J. Am. Chem. Soc. 1989, 111, 321-335.
-
(1989)
J. Am. Chem. Soc
, vol.111
, pp. 321-335
-
-
Bain, C.D.1
Troughton, E.B.2
Tao, Y.T.3
Evall, J.4
Whitesides, G.M.5
Nuzzo, R.G.6
-
46
-
-
33751154385
-
-
3 chains grafted with ∼50% molecularly uniform coverages across planar surfaces [Parikh, A. N.; Liedberg, B.; Atre, S. V.; Ho, M.; Allara, D. L. J. Am. Chem. Soc. 1995, 99 (24), 9996-10008.
-
3 chains grafted with ∼50% molecularly uniform coverages across planar surfaces [Parikh, A. N.; Liedberg, B.; Atre, S. V.; Ho, M.; Allara, D. L. J. Am. Chem. Soc. 1995, 99 (24), 9996-10008.
-
-
-
-
47
-
-
0001143320
-
-
H2O(adv) ≈ 83° for the MHA|MH adlayer sample, these results suggest that the MH adlayer has a coverage of <50% and/or is not uniformly distributed, viz., is distributed as islands.
-
H2O(adv) ≈ 83° for the MHA|MH adlayer sample, these results suggest that the MH adlayer has a coverage of <50% and/or is not uniformly distributed, viz., is distributed as islands.
-
-
-
-
48
-
-
33846865858
-
-
2- units in the MHA|MH film.
-
2- units in the MHA|MH film.
-
-
-
-
49
-
-
0037128056
-
-
Laffineur, F.; Delhalle, J.; Guittard, S.; Geribaldi, S.; Mekhalif, Z. Colloids Surf., A 2002, 198 817-827.
-
(2002)
Colloids Surf., A
, vol.198
, pp. 817-827
-
-
Laffineur, F.1
Delhalle, J.2
Guittard, S.3
Geribaldi, S.4
Mekhalif, Z.5
-
50
-
-
33846875914
-
-
2p3/2 electrons were fixed to the literature values of 161.9 for Au-S, 162.4 for Cu-S, and 163.5 for S-H (free thiol). The full widths at half-maximum (fwhm's) were allowed to range from 0.8 to 1.0 eV, based upon the fwhm of the MHA SAM spectrum, and the fwhim's of all the peaks were fixed equal to each other.
-
2p3/2 electrons were fixed to the literature values of 161.9 for Au-S, 162.4 for Cu-S, and 163.5 for S-H (free thiol). The full widths at half-maximum (fwhm's) were allowed to range from 0.8 to 1.0 eV, based upon the fwhm of the MHA SAM spectrum, and the fwhim's of all the peaks were fixed equal to each other.
-
-
-
-
52
-
-
33846859599
-
-
To calculate the relative intensity, it is necessary to first take into account the depth of the samples and how much the signal is attenuated. The intensity of each sulfur atom was adjusted using the following equation: I(S, I0(S) e-d/(λ sin θ, where I(S) is the intensity from the gold photoelectrons attenuated by the monolayer, I0(S) is the intensity of a clean sulfur substrate, d is the depth. θ is the takeoff angle (90°, and λ is the photoelectron mean free path 3.6 nm, By manipulating the equation, the ratio of S-Cu to S-Au can be found, IS-Au IS-Cu, e-Δd/λ, where Δd is the difference in the depth between the two sulfurs. For 16- mercaptohexadecanoic acid the ratio is IS-Au/I S-Cu, 0.558, and for 15-mercaptoheptadecanoic acid the ratio is IS-Au/I
-
S-Cu = 0.574.
-
-
-
-
53
-
-
33846864730
-
-
- C-D modes for pure deuterated MH monolayers on Au were used as reference spectra.
-
- C-D modes for pure deuterated MH monolayers on Au were used as reference spectra.
-
-
-
-
54
-
-
33846869099
-
-
Simulations of a multilayered surface utilizing a Maxwell Garnett effective medium approximation combined with anisotropic chain structures (uniaxial symmetry) yielded generally poor fits. It is presumed that this is due primarily to the nonuniform distribution of orientations of MH molecules on the surface
-
Simulations of a multilayered surface utilizing a Maxwell Garnett effective medium approximation combined with anisotropic chain structures (uniaxial symmetry) yielded generally poor fits. It is presumed that this is due primarily to the nonuniform distribution of orientations of MH molecules on the surface.
-
-
-
-
55
-
-
0031273451
-
-
Brandsch, R.; Bar, G.; Whangbo, M. H. Langmmr 1997, 13 (24), 6349-6353.
-
(1997)
Langmmr
, vol.13
, Issue.24
, pp. 6349-6353
-
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Brandsch, R.1
Bar, G.2
Whangbo, M.H.3
-
56
-
-
33846885271
-
-
Contact mode AFM was found to be highly damaging to the surface caused by the tip interactions easily moving the adlayer islands around the surface. These effects could be significantly reduced by optimizing the tapping oscillation amplitudes
-
Contact mode AFM was found to be highly damaging to the surface caused by the tip interactions easily moving the adlayer islands around the surface. These effects could be significantly reduced by optimizing the tapping oscillation amplitudes.
-
-
-
-
57
-
-
0033065028
-
-
Espinet. P.; Lequerica, M. C.; Martin-Alvarez, J. M. Chem.-Eur. J. 1999, 5 (7), 1982-1986.
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(1999)
Chem.-Eur. J
, vol.5
, Issue.7
, pp. 1982-1986
-
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Espinet, P.1
Lequerica, M.C.2
Martin-Alvarez, J.M.3
-
59
-
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33846886772
-
-
An average of 5% of the original intensity often remainsm and this reduced intensity does not significantly decrease with longer copper solution deposition times. The remaining signal is attributed to a small fraction of the reactive carboxylic acid sites at the interface being protected by hexadecanethiol molecules physically blocking the path to the acid group
-
An average of 5% of the original intensity often remainsm and this reduced intensity does not significantly decrease with longer copper solution deposition times. The remaining signal is attributed to a small fraction of the reactive carboxylic acid sites at the interface being protected by hexadecanethiol molecules physically blocking the path to the acid group.
-
-
-
-
60
-
-
33846872604
-
-
With deposition times above 2 h, the presence of free thiol at 164 eV can sometimes be seen in the sulfur XPS spectra, an indication of significant amounts of physisorbed hexadecanethiol on the surface
-
With deposition times above 2 h, the presence of free thiol at 164 eV can sometimes be seen in the sulfur XPS spectra, an indication of significant amounts of physisorbed hexadecanethiol on the surface.
-
-
-
-
61
-
-
33846857361
-
-
We also note that with longer solution deposition times (up to 24 h) impurity signatures increasingly begin to appear in the IR spectra which can be associated with adsorption and trapping of organic materials such as solvent and ambient contaminants.
-
We also note that with longer solution deposition times (up to 24 h) impurity signatures increasingly begin to appear in the IR spectra which can be associated with adsorption and trapping of organic materials such as solvent and ambient contaminants.
-
-
-
-
62
-
-
33846864486
-
-
33 is 21.3 Å; for 16-mercaptohexadecanoic acid it is 22.3 Å.
-
33 is 21.3 Å; for 16-mercaptohexadecanoic acid it is 22.3 Å.
-
-
-
-
63
-
-
33846890235
-
-
It is possible that some of the adlayer did not react with the copper, thus forming an incomplete adlayer; however, longer deposition times did not reduce these peaks significantly
-
It is possible that some of the adlayer did not react with the copper, thus forming an incomplete adlayer; however, longer deposition times did not reduce these peaks significantly.
-
-
-
-
64
-
-
33846867522
-
-
Without knowing the surface density of these adsorbates and the problems with the overlapping CH wagging modes, it is difficult to determine an accurate orientation
-
Without knowing the surface density of these adsorbates and the problems with the overlapping CH wagging modes, it is difficult to determine an accurate orientation.
-
-
-
-
65
-
-
33846891144
-
-
It is unclear whether the free thiols on the inverted MHA molecules react with the copper and allow for the formation of an additional adlayer at that site. Previous work on dithiol multilayers suggests that such a site would be active for adlayer formation.10 Our experimental methods do not allow any definitive conclusion regarding further addition, but if it did occur, as expected, it would contribute to roughening of the multilayer structure by formation of islands of chains at the terminal layer of the multilayer stack with deterioration of the molecular ruler characteristics
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10 Our experimental methods do not allow any definitive conclusion regarding further addition, but if it did occur, as expected, it would contribute to "roughening" of the multilayer structure by formation of islands of chains at the terminal layer of the multilayer stack with deterioration of the "molecular ruler" characteristics.
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66
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33846855595
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We were unable to determine the amount of Cu(II) and S in the MHA|MHA|MH film relative to the MHA|MHA bilayer due to the complexity of the trilayer structure in terms of modeling the attenuation of the photoelectron fluxes. Also, X-ray beam induced Cu(II) autoreduction made the Cu analysis somewhat problematic.
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We were unable to determine the amount of Cu(II) and S in the MHA|MHA|MH film relative to the MHA|MHA bilayer due to the complexity of the trilayer structure in terms of modeling the attenuation of the photoelectron fluxes. Also, X-ray beam induced Cu(II) autoreduction made the Cu analysis somewhat problematic.
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67
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33846881390
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Unfortunately, with the densified trilayer sample point the overlayer thickness becomes too large to allow useful interpretations of the XPS Au-S S 2p core level spectra. This can be seen in Figure 17, spectrum J, where the Cu-S species dominate with only a shoulder of the Au-S observable.
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Unfortunately, with the densified trilayer sample point the overlayer thickness becomes too large to allow useful interpretations of the XPS Au-S S 2p core level spectra. This can be seen in Figure 17, spectrum J, where the Cu-S species dominate with only a shoulder of the Au-S observable.
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