Applicability of magic angle for angle-resolved X-ray photoelectron spectroscopy of corrugated SiO2/Si surfaces: Monte Carlo calculations

Surface Science

Volumn 602, Issue 14, 2008, Pages 2581-2586

  Olejnik, K ^a   Zemek, J ^a  

^a INSTITUTE OF PHYSICS   (Czech Republic)

Author keywords

Magic angle; Monte Carlo calculations; Overlayer thickness; Photoelectron spectroscopy; Surface roughness

Indexed keywords

ELECTRONS; EMISSION SPECTROSCOPY; MOLECULAR BEAM EPITAXY; MOLECULAR ORBITALS; MOLECULAR SPECTROSCOPY; PHOTOELECTRON SPECTROSCOPY; PHOTOELECTRONS; PHOTOIONIZATION; PHOTONS; SILICA; SILICON COMPOUNDS; SURFACE ROUGHNESS; THICKNESS MEASUREMENT;

(1 1 0) SURFACE; ANGLE-RESOLVED X-RAY PHOTOELECTRON SPECTROSCOPY (AR-XPS); ELASTIC SCATTERING EVENTS; ELSEVIER (CO); EXPERIMENTAL ERRORS; MAGIC ANGLE (MA); MONTE CARLO CALCULATIONS; OVERLAYER THICKNESS; SILICON (0 0 1) SURFACES; SILICON DIOXIDE FILMS; SURFACE CONTAMINATIONS; SURFACE CORRUGATIONS; SURFACE EXCITATIONS; X RAY PHOTOELECTRON SPECTRA (XPS);

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 48149110827     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2008.06.007     Document Type: Article

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