Photoelectron spectroscopy from randomly corrugated surfaces

Surface Science

Volumn 602, Issue 7, 2008, Pages 1440-1446

  Zemek, J ^a   Olejnik, K ^a   Klapetek, P ^b  

^a INSTITUTE OF PHYSICS   (Czech Republic)

^b CZECH METROLOGY INSTITUTE   (Czech Republic)

Author keywords

AFM; Monte Carlo calculation; Overlayer thickness estimation; Random surface roughness; Surface roughness; X ray photoelectron spectroscopy

Indexed keywords

ATOMIC FORCE MICROSCOPY; MONTE CARLO METHODS; RANDOM PROCESSES; SILICON; SURFACE ROUGHNESS; X RAY PHOTOELECTRON SPECTROSCOPY;

CORRUGATED SURFACES; MONTE-CARLO CALCULATION; RANDOM SURFACE ROUGHNESS;

SURFACE ANALYSIS;

EID: 41049095279     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2008.02.006     Document Type: Article

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