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Surface Science

Volumn 602, Issue 12, 2008, Pages 2114-2120

Effect of surface roughness on EPES and AREPES measurements: Flat and crenels silicon surfaces

(5) Chelda, S a Robert Goumet, C a Gruzza, B a Bideux, L a Monier, G a

a UNIVERSITÉ BLAISE PASCAL (France)

Author keywords

Elastic electron backscattering; Elastic peak electron spectroscopy (EPES); Monte Carlo simulation; Surface roughness

Indexed keywords

BACKSCATTERING; COMPUTER SIMULATION; ELECTRON BEAMS; ELECTRON SPECTROSCOPY; SILICON; SURFACE ROUGHNESS;

ELASTIC ELECTRON BACKSCATTERING; ELASTIC PEAK ELECTRON SPECTROSCOPY (EPES); SURFACE REGIONS;

SURFACE CHEMISTRY;

EID: 44949122428 PISSN: 00396028 EISSN: None Source Type: Journal
DOI: 10.1016/j.susc.2008.04.020 Document Type: Article

Times cited : (14)

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