Overlayer corrections in XPS

Surface and Interface Analysis

Volumn 26, Issue 5, 1998, Pages 352-358

  Zalm, P C ^a  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

Overlayer effects; Peak attenuation; Quantitative surface analysis; X ray photoelectron spectroscopy; XPS

Indexed keywords

CHEMICAL ANALYSIS; SURFACE TESTING;

QUANTITATIVE ANALYSIS; SURFACE ANALYSIS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0032070745     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1096-9918(19980501)26:5<352::AID-SIA378>3.0.CO;2-L     Document Type: Article

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