Inactivation of Bacillus atrophaeus and of Aspergillus niger using beams of argon ions, of oxygen molecules and of oxygen atoms

Journal of Physics D: Applied Physics

Volumn 41, Issue 11, 2008, Pages

  Raballand, V ^a   Benedikt, J ^a   Wunderlich, J ^b   Von Keudell, A ^a  

^a RUHR UNIVERSITY BOCHUM   (Germany)

^b FRAUNHOFER INSTITUTE FOR PROCESS ENGINEERING AND PACKAGING IVV   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; DEFECTS; ETCHING; FUNGUS PROTECTION; PLASMAS; SPUTTERING;

ARGON IONS; INACTIVATION; LOW PRESSURE PLASMAS; SIGNIFICANT INACTIVATION;

BACTERIA;

EID: 44449134916     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/41/11/115207     Document Type: Article

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