Effects of plasma etching on DLC films

Thin Solid Films

Volumn 343-344, Issue 1-2, 1999, Pages 381-384

  Massi, M ^a   Mansano, R D ^a   Maciel, H S ^b   Otani, C ^b   Verdonck, P ^a   Nishioka, L N B M ^b  

^a UNIVERSITY OF SÃO PAULO   (Brazil)

^b INSTITUTO TECNOLÓGICO DE AERONÁUTICA   (Brazil)

Author keywords

Diamond; Etching; Plasma processing and deposition; Raman scattering

Indexed keywords

ANISOTROPY; DIAMOND FILMS; HYDROGENATION; MAGNETRON SPUTTERING; PLASMA ETCHING; RAMAN SCATTERING; REACTIVE ION ETCHING;

DIAMOND LIKE CARBON (DLC) FILMS; PLASMA DEPOSITION;

THIN FILMS;

EID: 0032673534     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01691-5     Document Type: Article

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