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EPJ Applied Physics

Volumn 37, Issue 3, 2007, Pages 299-305

Plasma etching of organic material: Combined effects of charged and neutral species

(3) Murillo, R a Poncin Epaillard, F b Segui, Y a

a UNIVERSITÉ DE TOULOUSE (France)

b UNIVERSITÉ DU MAINE (France)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTORS; CYCLOTRON RESONANCE; ION BOMBARDMENT; MATHEMATICAL MODELS; OPTICAL EMISSION SPECTROSCOPY; PLASMA ETCHING;

COMPOSITION ANALYSIS; DISTRIBUTED ELECTRON CYCLOTRON RESONANCE (DECR); STERIC EXCLUSION CHROMATOGRAPHY (SEC);

BIOLOGICAL MATERIALS;

EID: 34047119560 PISSN: 12860042 EISSN: 12860050 Source Type: Journal
DOI: 10.1051/epjap:2007031 Document Type: Article

Times cited : (27)

References (27)

1
- 34047110542
- C. Aenlle, International Herald Tribune (12/19/1991)
- C. Aenlle, International Herald Tribune (12/19/1991)

2
- 0004201645
- Academic Press, New York
- H.K. Yasuda, Plasma polymerisation (Academic Press, New York, 1985)
- (1985) Plasma polymerisation
- Yasuda, H.K.¹

3
- 0000012891
- M. Pons, O. Joubert, P. Paniez, J. Pelletier, J. Appl. Phys. 70, 2376 (1991)
- (1991) J. Appl. Phys , vol.70 , pp. 2376
- Pons, M.¹ Joubert, O.² Paniez, P.³ Pelletier, J.⁴

4
- 0001451415
- R.H Hansen, J.V. Pascale, T. DeBenedictis, P.M. Rentzepis, J. Polym. Sci. Part A 3, 2205 (1965)
- (1965) J. Polym. Sci. Part A , vol.3 , pp. 2205
- Hansen, R.H.¹ Pascale, J.V.² DeBenedictis, T.³ Rentzepis, P.M.⁴

5
- 0017460203
- J.F. Battey, IEEE T. Electron Dev. 24, 140 (1977)
- (1977) IEEE T. Electron Dev , vol.24 , pp. 140
- Battey, J.F.¹

6
- 33646531219
- Plasma Chem
- V. Hody, T. Belmonte, C.D. Pintassilgo, F. Poncin-Epaillard, T. Czerwiec, G. Hendrion, Y. Segui, J. Loureiro, Plasma Chem. Plasma P. 26, 251 (2006)
- (2006) Plasma P , vol.26 , pp. 251
- Hody, V.¹ Belmonte, T.² Pintassilgo, C.D.³ Poncin-Epaillard, F.⁴ Czerwiec, T.⁵ Hendrion, G.⁶ Segui, Y.⁷ Loureiro, J.⁸

7
- 0000493081
- J.A.G. Baggerman, R.J. Visser, J.H. Collart, J. Appl. Phys. 75, 758 (1994)
- (1994) J. Appl. Phys , vol.75 , pp. 758
- Baggerman, J.A.G.¹ Visser, R.J.² Collart, J.H.³

8
- 0023382936
- B. Lamontagne, A.M. Wrobel, G. Jalbert, M.R. Wertheimer, J. Phys. D 20, 844 (1987)
- (1987) J. Phys. D , vol.20 , pp. 844
- Lamontagne, B.¹ Wrobel, A.M.² Jalbert, G.³ Wertheimer, M.R.⁴

9
- 0000626771
- O. Joubert, J. Pelletier, Y. Arnal, J. Appl. Phys. 65, 5096 (1989)
- (1989) J. Appl. Phys , vol.65 , pp. 5096
- Joubert, O.¹ Pelletier, J.² Arnal, Y.³

10
- 34047098164
- Washington, DC, p
- W. Varhue, J. Burroughs, W. Mylnko, Proceedings of the Third International Symposium on Ultra Large Scale Integration Science and Technology. VLSI Science and Technology 1991, Washington, DC, p. 244
- (1991) Proceedings of the Third International Symposium on Ultra Large Scale Integration Science and Technology. VLSI Science and Technology , pp. 244
- Varhue, W.¹ Burroughs, J.² Mylnko, W.³

11
- 84985615000
- F. Clouet, M.K. Shi, J. Appl. Polym. Sci. 46, 1955 (1992)
- (1992) J. Appl. Polym. Sci , vol.46 , pp. 1955
- Clouet, F.¹ Shi, M.K.²

12
- 0030110023
- W. Wang, F. Poncin-Epaillard, J.-C. Brosse, D. Ausserre, Plasmas Polymers 1, 65 (1996)
- (1996) Plasmas Polymers , vol.1 , pp. 65
- Wang, W.¹ Poncin-Epaillard, F.² Brosse, J.-C.³ Ausserre, D.⁴

13
- 0028603223
- F. Poncin-Epaillard, I. Rouger, J.P. Gilles, J.P. Grandchamp, J. Macromol. Sci. Pure 31, 1087 (1994)
- (1994) J. Macromol. Sci. Pure , vol.31 , pp. 1087
- Poncin-Epaillard, F.¹ Rouger, I.² Gilles, J.P.³ Grandchamp, J.P.⁴

14
- 0032000635
- R.D. Boyd, A.M. Kenwright, J.P.S. Baydal, Acta Polym. 49, 129 (1998)
- (1998) Acta Polym , vol.49 , pp. 129
- Boyd, R.D.¹ Kenwright, A.M.² Baydal, J.P.S.³

15
- 33645233531
- V. Hody, T. Belmonte, T. Czerwiec, G. Henrion, J.M. Thiebaut, Thin Solid Films 506, 212 (2006)
- (2006) Thin Solid Films , vol.506 , pp. 212
- Hody, V.¹ Belmonte, T.² Czerwiec, T.³ Henrion, G.⁴ Thiebaut, J.M.⁵

16
- 0024304195
- B. Despax, J.L. Floutard, Thin Solid Films 168, 81 (1989)
- (1989) Thin Solid Films , vol.168 , pp. 81
- Despax, B.¹ Floutard, J.L.²

17
- 36549098208
- M. Pichot, A. Durandet, Y. Arnal, L. Vallier, Rev. Sci. Instrum. 59, 1072 (1988)
- (1988) Rev. Sci. Instrum , vol.59 , pp. 1072
- Pichot, M.¹ Durandet, A.² Arnal, Y.³ Vallier, L.⁴

18
- 3643098286
- J. Pelletier, Y. Arnal, O. Joubert, Appl. Phys. Lett. 53, 1914 (1988)
- (1988) Appl. Phys. Lett , vol.53 , pp. 1914
- Pelletier, J.¹ Arnal, Y.² Joubert, O.³

19
- 0032179705
- T. Lagarde, Y. Arnal, J. Pelletier, J. Phys. IV France 8, 121 (1998)
- (1998) J. Phys. IV France , vol.8 , pp. 121
- Lagarde, T.¹ Arnal, Y.² Pelletier, J.³

20
- 0035476923
- K. Takechi, M.A. Lieberman, J. Appl. Phys. 90, 3205 (2001)
- (2001) J. Appl. Phys , vol.90 , pp. 3205
- Takechi, K.¹ Lieberman, M.A.²

21
- 0018469799
- J.W. Coburn, H.F. Winters, J. Appl. Phys. 50, 3189 (1979)
- (1979) J. Appl. Phys , vol.50 , pp. 3189
- Coburn, J.W.¹ Winters, H.F.²

22
- 0020829528
- B. Dischler, A. Bubenzer, P. Koidl, Solid State Commun. 48, 105 (1983)
- (1983) Solid State Commun , vol.48 , pp. 105
- Dischler, B.¹ Bubenzer, A.² Koidl, P.³

23
- 0031224799
- S.D. Lee, M. Sarmadi, F. Denes, J.L. Shohet, Plasmas Polymers 2, 177 (1997)
- (1997) Plasmas Polymers , vol.2 , pp. 177
- Lee, S.D.¹ Sarmadi, M.² Denes, F.³ Shohet, J.L.⁴

24
- 0242551867
- H. Drnovskà, L. Làcpcik Jr., V. Bursikovà, J. Zemek, A.M. Barros-Timmons, Colloid. Polym. Sci. 281, 1025 (2003)
- (2003) Colloid. Polym. Sci , vol.281 , pp. 1025
- Drnovskà, H.¹ Làcpcik Jr., L.² Bursikovà, V.³ Zemek, J.⁴ Barros-Timmons, A.M.⁵

25
- 0001387869
- O. Joubert, J. Pelletier, C. Fiori, T.A. Nguyen Ta., J. Appl. Phys. 67, 4291 (1990)
- (1990) J. Appl. Phys , vol.67 , pp. 4291
- Joubert, O.¹ Pelletier, J.² Fiori, C.³ Nguyen Ta, T.A.⁴

26
- 0018208012
- L. Holland, S.M. Ojha, Thin Solid Films 58, 107 (1979)
- (1979) Thin Solid Films , vol.58 , pp. 107
- Holland, L.¹ Ojha, S.M.²

27
- 2942638070
- V. Stelmashuk, H. Biederman, D. Slavinska, M. Trochva, P. Hlidek, Vacuum 75, 207 (2004)
- (2004) Vacuum , vol.75 , pp. 207
- Stelmashuk, V.¹ Biederman, H.² Slavinska, D.³ Trochva, M.⁴ Hlidek, P.⁵

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