Monte Carlo simulation of electrodeposition of copper: A multistep free energy calculation

Journal of Physical Chemistry B

Volumn 112, Issue 13, 2008, Pages 4036-4047

  Harinipriya, S ^a   Subramanian, Venkat R ^a  

^a Tennessee Technological University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; COPPER COMPOUNDS; COPPER PLATING; DYNAMICS; ELECTRODEPOSITION; FREE ENERGY; HYDRATION; METALLIZING; MODEL STRUCTURES; MOLECULAR DYNAMICS; PARAMETER ESTIMATION; QUANTUM CHEMISTRY; SURFACE DIFFUSION; THICKNESS MEASUREMENT;

COPPER (CU); ELECTROCHEMICAL COPPER DEPOSITION; ENERGY CALCULATIONS; FREE ENERGY CHANGE; HYDRATION NUMBERS; KINETIC MONTE CARLO (KMC); KMC METHODS; LENGTH SCALING; MONTE CARLO (MC); MONTE CARLO CODES; MONTE CARLO SIMULATION (MCS); NUMBER OF SPECIES; RANDOM NUMBERS; REDOX POTENTIAL (RP); SIMULATION ALGORITHMS;

MONTE CARLO METHODS;

COPPER; COPPER SULFATE; CUPRIC CHLORIDE; ELECTROLYTE;

ARTICLE; CHEMISTRY; COMPUTER SIMULATION; DIFFUSION; ELECTRODE; ELECTRON; ELECTROPLATING INDUSTRY; MONTE CARLO METHOD; SURFACE PROPERTY; THERMODYNAMICS;

COMPUTER SIMULATION; COPPER; COPPER SULFATE; DIFFUSION; ELECTRODES; ELECTROLYTES; ELECTRONS; ELECTROPLATING; MONTE CARLO METHOD; SURFACE PROPERTIES; THERMODYNAMICS;

EID: 45849105985     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp076191a     Document Type: Article

References (62)

1. Kesmodel, L. L.; Falicov. L. Solid State Commun. 1975, 16, 1201.
2. Vereecken, P.; Binstead, R.; Deligianni, H.; Andricacos, P. IBM J. Res. Develo. 2005, 49, 3.
3. Price, D. L.; Halley, J. J. Chem. Phys. 1995, 102, 6603.
4. Romankiw, L. T.; Croll, I.; Hatzakis, M. IEEE Trans. Mag. 1970, MAG-3, 597.
5. Löchel, B.; Maciossek, A.; König, M.; Huber, H-L.; Bauer, G. Microeledron. Eng. 1993, 21, 463.
6. Yang, F. Y. Science 1999, 284, 1335.
7. Barrett, J. J.; Smits, E. M.; Moran, P. L. Proc. Integrated Circuit Technology Conf. 1986.
8. Andricacos, P. C. IBM J. Res. Develop. 1998, 42, 567.
9. Datta, M. IBM J. Res. Develop. 1998, 42, 563.
10. Löchel, B.; Maciossek, A.; Quenzer, H. J.; Wagner, B. J. Eledrochem. Soc. 1996, 143, 237.
11. Li, C. Z.; Tao, N. J. Appl. Phys. Lett. 1998, 72, 894.
12. Morpurgo, A. F.; Marcus, C. M.; Robinson, D. B. Appl. Phys. Lett. 1999, 74, 2084.
13. Li, C. Z.; Bogozi, A.; Huang, W.; Tao, N. J. Nanotechnology 1999, 10, 221.
14. Mingshaw, W. W.; Lydia, L. S. IEEE Elec. Device Lett. 2000 21
15. Lingk, C.; Gross, M. E. J. Appl. Phys. 1998, 84, 5547.
16. Krongelb, S.; Romankiw, L. T.; Tornello, J. A. IBM J. Res. Develop. 1998, 42, 575.
17. Batinat, N.; Kolb, D. M. Langmuir 1992, 8, 2572.
18. Edelstein, D. C.; Andricacos, P. C.; Agarwala, B.; Carnell, C.; Chung, D.; Cooney, E., III.; Cote, W.; Locke, P.; Luce, S.; Megivern, C.; Wachnik, R.; Walton, E. Electrochem. Soc. Proc. Ser. 1999, 99-9, 1.
19. Basol, B.; Uzoh, C.; Talieh, H.; Wang, T.; Guo, G.; Erdemli, S.; Mai, D.; Lindquist, P.; Bogart, J.; Cornejo, M.; Cornejo, M.; Basol, E. The National AIChE Meeting, San Francisco CA. Nov. 17-18, 2003.
20. Andricacos, P. C. Electrochem. Soc. Interface 1999, 8, 32.
21. Harper, J. M. E.; Cabrai, C., JR.; Andricacos, P. C.; Gignac, L.; Noyan, I. C.; Rodbell, K. P.; Hu, C. K J. Appl. Phys. 1999, 86, 2516.
22. Budevski, E.; Staikov, G.; Lorenz, W. J. Electrochemical Phase Formation and Growth; VCH: Weinheim, Germany, 1996.
23. Dini, J. W. In Modem Electroplating, 4th ed.; Schlesinger, M.; Paunovic, M., Eds.; Wiley: New York, 2000.
24. Andricacos, P. C.; Uzoh, C.; Dukovic, J. O.; Horkans, J.; Deligianni, H. IBM J. Res. Develop. 1998, 42, 567.
25. Nikolic, N. D.; Popov, K. I.; Pavlovic, L. J.; Pavlovic, M. G Sensors 2007, 7, 1.
26. Cheol, S. H.; Dong, J.; Liu, M. Adv. Mater. 2003, 15, 1610.
27. Dima, G. E.; de Vooys, A. G A.; Koper, M. T. M. J. Electroanal. Chem. 2003, 554-555, 15.
28. Pletcher, D.; Poorbedi, Z. Electrochim. Acta 1979, 24, 1253.
29. Grujicic, D.; Pesic, B. Electrochim. Acta 2005, 50, 4426.
30. Grujicic, D.; Pesic, B. Electrochim. Acta 2002, 47, 2901.
31. Danilov, A. I.; Molodokina, E. B.; Yu, M. Polukarov Russ. J. Electrochem. 2002, 38, 732.
32. Danilov, A. I.; Molodokina, E. B.; Baitov, A. A.; Pobelov, I. V.; Yu, M. Polukarov Russ. J. Electrochem. 2002, 38, 836.
33. Oskam, G.; Vereecken, P. M.; Searson, P. C J. Electrochem. Soc. 1999, 146, 1436.
34. Radisic, A.; Long, J. G.; Hoffmann, P. M.; Searson, P. C J. Electrochem. Soc. 2001, 148, C41.
35. Drews, T. O.; Webb, E. G.; Ma, D. L.; Alameda, J.; Braatz, R. D.; Alkire, R. C AIChE J. 2004, 50, 1.
36. Pricer, T. J.; Kushner, M. J.; Alkire, R. C. J. Electrochem. Soc. 2002, 149, C396.
37. Scharifker, B.; Hills, G. Electrochim. Acta 1983, 28, 879.
38. Drews, T. O.; Braatz, R. D.; Alkire, R. G Intl. J. Multiscale Comput. Eng. 2004, 2, 313.
39. Drews, T. O.; Webb, E. G.; Ma, D. L.; Alameda, J.; Braatz, R. D.; Alkire, R. G AIChE J. 2004, 50, 226.
40. Gillespie, D. J. Chem. Phys. 2001, 115, 1716.
41. Cao, Y.; Gillespie, D.; Petzold, L. J. Chem. Phys. 2006, 124, 044109.
42. Yang, Y. G.; Johnson, R. A.; Wadley, H. N. G. Acta Mater. 1997, 45, 1455.
43. Huang, H.; Filmer, G. H.; Diaz de la Rubia, T. J. Appl. Phys. 1998, 84, 3636.
44. Wang, L.; Clancy, P. Surf. Sci. 2001, 473, 25.
45. Gilmer, G. H.; Huang, H.; Tomas, Diaz de la Rubia; Torre, J. D.; Baumann, F. Thin Solid Films 2000, 365, 189.
46. Pomeroy, J. M; Jacobsen, J; Colin C; Cooper, B. H.; Sethna, J. P. Phys. Rev B 2002, 66, 235412.
47. Liu, C. L.; Cohen, J. M.; Adams, J. B.; Voter, A. F. Surf. Sci. 1991, 255, 334.
48. Stumpf, R.; Scheffler, M. Phys. Rev. B 1996, 53, 4958.
49. Coronen, D. G.; Hansen, D. E.; Vorter, A. F.; Liu, C. L.; Liu, X. Y.; Kress, J. D. Appl. Phys. Lett. 1998, 73, 3860.
50. Liu, Z.-I.; Yu, L.; Yao, K.-l; Jing, X.-b; Li, X.-a.; and X-a.; Sun, X.-z. J. Phys. D: Appl. Phys. 2005, 38, 4202.
51. Harinipriya, S.; Sudha, V.; Sangaranaryanan, M. V. Langmuir 2004, 20, 1871.
52. Bockris, J. O'M.; Conway, B. E Modern Aspects of Electrochemistry; Academic Press, Inc.: New York 1954; Vol. 1, Chapter 1.
53. See for example, Shklovskii, B. I.; Eforos, A. L. Electronic properties of doped semiconductors; Springer-Verlag: New York, 1984.
54. Faules Fritsch, I.; Faulkner, R. L. A. J. Electroanal. Chem. 1989, 263, 237.
55. Mclendon, G.; Miller, J. R. J. Am. Chem. Soc. 1985, 107, 7811.
56. Atkins, P. W. Physical Chemistry, 5th ed.; Oxford Univ. Press: New York, 1994.
57. Bockris, J. O'M.; Reddy, A. K. N Modern Electrochemistry; Plenum Press, Inc.: New York, 1977; Vol. 2, Chapter 8.
58. Marti, J.; Csajka, F. S. J. Chem. Phys. 2000, 113, 1154.
59. Bockris J. O'M.; Reddy, A. K. N. Modern Electrochemistry; Plenum Press, Inc.: New York, 1977; Vol. 2, Chapter 10.
60. Dow, W.-P.; Huang, H.-S.; Yen, M.-Y.; Chen, H.-H. J. Electrochem. Soc. 2005, 152, C77.
61. Li, X.; Drews, T. O.; Rusli, E.; Xue, F.; He, Y.; Braatz, R. D.; Alkire, R. C. J. Electrochem. Soc. 2007, 154, D230.
62. Rusli, E.; Xue, F.; Drews, T. O.; Vereecken, P.; Andracacos, P.; Deligianni, H.; Braatz, R. D.; Alkire, R. C. J. Electrochem. Soc. 2007, 154, D584.