Recrystallization kinetics of electroplated Cu in damascene trenches at room temperature

Journal of Applied Physics

Volumn 84, Issue 10, 1998, Pages 5547-5553

  Lingk, C ^a   Gross, M E ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000729886     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.368856     Document Type: Article

References (14)

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4. In the literature, the terms grain growth and recrystallization are often used interchangeably when referring to these phenomena in secondary mode.
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