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Volumn 17, Issue 3, 2008, Pages 735-740

Nanoscale pattern definition on nonplanar surfaces using ion beam proximity lithography and conformal plasma-deposited resist

Author keywords

Ion beam proximity lithography (IBL); Microelectromechanical devices; Monolithic integrated circuits (ICs); Nanotechnology; Plasma CVD; Resists

Indexed keywords

BEAM PLASMA INTERACTIONS; CHARGED PARTICLES; CLADDING (COATING); COATING TECHNIQUES; ELECTRONS; ESTERS; ION BEAMS; ION BOMBARDMENT; IONS; MASKS; PAPER COATING; PHOTORESISTS; PLASMA (HUMAN); PLASMAS; SILICON;

EID: 45449106629     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2008.921730     Document Type: Article
Times cited : (12)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.