Positive- And negative-tone CVD polyacrylic electron-beam resists developable by supercritical CO2

Chemical Vapor Deposition

Volumn 12, Issue 5, 2006, Pages 259-262

  Mao, Yu ^a   Felix, Nelson M ^b   Nguyen, Peter T ^b   Ober, Christopher K ^b   Gleason, Karen K ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b Department of Obstetrics Gynecology   (United States)

Author keywords

Copolymerization; Initiated CVD; Resists; Supercritical CO2

Indexed keywords

ABS RESINS; ACRYLIC MONOMERS; CARBON DIOXIDE; CHEMICAL VAPOR DEPOSITION; COPOLYMERIZATION; COPOLYMERS; FLUORINE; FUNCTIONAL GROUPS; NANOSTRUCTURED MATERIALS; PLASTIC PRODUCTS; POLYACRYLATES; POLYMERS; SOLUBILITY; TERNARY SYSTEMS; TURBULENT FLOW;

CHAINSCISSION REACTIONS; CROSS-LINKING; END GROUPS; EPOXY GROUPS; ETHYL METHACRYLATES; FLUORINATED ACRYLATES; GLYCIDYL METHACRYLATES; INITIATED CVD; LITHOGRAPHIC PROCESSES; LOW ENERGIES; LOW TEMPERATURES; METHACRYLIC ACIDS; ORGANIC FUNCTIONAL GROUPS; RESIST LAYERS; RESISTS; SUPERCRITICAL CARBON DIOXIDES; SUPERCRITICAL CO; SUPERCRITICAL CO2;

SUPERCRITICAL FLUID EXTRACTION;

EID: 34547713631     PISSN: 09481907     EISSN: 15213862     Source Type: Journal    
DOI: 10.1002/cvde.200506416     Document Type: Article

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