Towards all-dry lithography: Electron-beam patternable poly(glycidyl methacrylate) thin films from hot filament chemical vapor deposition

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 5, 2004, Pages 2473-2478

  Mao, Yu ^a   Felix, Nelson M ^b   Nguyen, Peter T ^b   Ober, Christopher K ^b   Gleason, Karen K ^a  

^a Massachusetts Institute of Technology Cambridge   (United States)

^b Cornell University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON-BEAM IRRADIATION; HOT FILAMENT CHEMICAL VAPOR DEPOSITION (HFCVD); SYNERGISTIC PROPERTIES; WET CHEMISTRY;

CHEMICAL VAPOR DEPOSITION; ELECTRON BEAMS; IRRADIATION; LITHOGRAPHY; MOLECULAR WEIGHT; SENSITIVITY ANALYSIS; SURFACE TENSION; SWELLING; THIN FILMS;

ORGANIC POLYMERS;

EID: 9744233683     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1800351     Document Type: Article

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