Scanning electron microscope dimensional metrology using a model-based library

Surface and Interface Analysis

Volumn 37, Issue 11, 2005, Pages 951-958

  Villarrubia, J S ^a   Vladar A E ^a   Postek, M T ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

Critical dimension (CD); Dimensional metrology; Linewidth; Model based library; Scanning electron microscopy (SEM)

Indexed keywords

ALGORITHMS; COMPUTER SIMULATION; FAILURE ANALYSIS; MEASUREMENTS; MONTE CARLO METHODS; SEMICONDUCTOR DEVICE MANUFACTURE;

CRITICAL DIMENSION (CD); DIMENSIONAL METROLOGY; LINEWIDTH; MODEL-BASED LIBRARY;

SCANNING ELECTRON MICROSCOPY;

EID: 28744435027     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/sia.2087     Document Type: Conference Paper

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