Design studies for a high brightness, energetic neutral atom source for proximity lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 6, 2007, Pages 2188-2191

  Guo, Hong Jie ^a   Craver, Barry ^a   Reynolds, Jackson ^a   Wolfe, John C ^a  

^a UNIVERSITY OF HOUSTON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HELIUM ION INJECTORS; PROXIMITY LITHOGRAPHY;

CHARGE TRANSFER; FULL WIDTH AT HALF MAXIMUM; IMAGE QUALITY; IMAGING SYSTEMS; MASKS; SILICON WAFERS;

ION BEAMS;

EID: 37149049620     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2804604     Document Type: Article

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