Photoresist coating methods for the integration of novel 3-D RF microstructures

Journal of Microelectromechanical Systems

Volumn 13, Issue 3, 2004, Pages 491-499

  Pham, Nga Phuong ^a   Boellaard, E ^a   Burghartz, Joachim N ^a   Sarro, Pasqualina M ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRODEPOSITION; INTEGRATED CIRCUIT MANUFACTURE; LITHOGRAPHY; MASKS; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; PHOTORESISTS; SPRAYED COATINGS; SURFACE TOPOGRAPHY;

MICROELECTROMECHANICAL SYSTEMS; MULTILEVEL MICROMACHINED STRUCTURES; PHOTORESIST COATING METHODS; THREE DIMENSIONAL TOPOGRAPHY SURFACES;

COATING TECHNIQUES;

EID: 3142731361     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2004.828728     Document Type: Article

References (13)

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