Development of a metal-tip cantilever for noncontact atomic force microscopy

Review of Scientific Instruments

Volumn 76, Issue 3, 2005, Pages

  Akiyama, Kotone ^a,b   Eguchi, T ^a,b   An, T ^a,b   Fujikawa, Y ^c   Yamada Takamura, Y ^c   Sakurai, T ^c   Hasegawa, Y ^a,b  

^a UNIVERSITY OF TOKYO   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^c TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

METAL-LAYER DEPOSITION; METAL-TIP CANTILEVER; MICROFABRICATION PROCESS; SILICON CANTILEVER;

CANTILEVER BEAMS; CHEMICAL VAPOR DEPOSITION; FRICTION; ION BEAMS; NATURAL FREQUENCIES; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; TRANSMISSION ELECTRON MICROSCOPY; ULTRAHIGH VACUUM;

ATOMIC FORCE MICROSCOPY;

EID: 17044412892     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1865812     Document Type: Article

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