A method for assembling nano-electromechanical devices on microcantilevers using focused ion beam technology

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 7 B, 2004, Pages 4624-4628

  Nagase, Masao ^a   Namatsu, Hideo ^a  

^a Kashino Diverse Brain Research Laboratory of NTT Communication Science Laboratories   (Japan)

Author keywords

Cantilever; FIB deposition; FIB milling; Focused ion beam; Four point probes; Nanotechnology; Resistivity measurement; Scanning probe microscopy

Indexed keywords

ELECTROMECHANICAL DEVICES; ELECTRON BEAM LITHOGRAPHY; MICROSTRUCTURE; MOSFET DEVICES; NANOTECHNOLOGY; SCANNING ELECTRON MICROSCOPY; SILICON; TRANSMISSION ELECTRON MICROSCOPY;

FIB MILLING; FOUR-POINT PROBES; MICROCANTILEVERS; RESISTIVITY MEASUREMENT; SCANNING PROBE MICROSCOPY;

ION BEAMS;

EID: 5144227956     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.4624     Document Type: Conference Paper

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