Electron beam nanolithography and testing: Ways of increasing the resolution and the throughput

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6995, Issue , 2008, Pages

  Zlobin, Vladimir A ^a  

^a ALL RUSSIAN ELECTROTECHNICAL INSTITUTE   (Russian Federation)

Author keywords

Electron beam lithography; Electron beam testing; Nanostructures; Theory

Indexed keywords

CHARGED PARTICLES; COMPUTER NETWORKS; ELECTRON BEAMS; ELECTRON DEVICES; ELECTRON GUNS; ELECTRON OPTICS; ELECTRONICS INDUSTRY; ELECTRONS; INTEGRATED OPTOELECTRONICS; MICROELECTRONICS; MICROOPTICS; MICROSYSTEMS; NANOLITHOGRAPHY; NANOTECHNOLOGY; PARTICLE BEAMS; PHOTONICS; TECHNOLOGY; TOOLS;

BEAM DIAMETERS; FOCUSED BEAMS; LITHOGRAPHY TOOLS; MICRO SYSTEMS TECHNOLOGY (MST); NANO SCALING; NANO-METROLOGY; NANO-PHOTONICS; OPTICAL (PET) (OPET); PATTERN GENERATION; WRITING SPEED;

ELECTRON BEAM LITHOGRAPHY;

EID: 45149113185     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.781847     Document Type: Conference Paper

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