Nikon EB stepper: Its system design and preliminary performance

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 I, Issue , 2003, Pages 504-511

  Hirayanagi, Noriyuki ^a   Fujiwara, Tomoharu ^a   Hada, Kazunari ^a   Shimoda, Toshimasa ^a   Suzuki, Kazuaki ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

Dynamic exposure; Dynamic resolution; EB stepper; Electron projection lithography (EPL); EPL reticle; Stencil reticle; Stitching; Synchronization control

Indexed keywords

FOCUSING; LITHOGRAPHY; SCANNING; SYNCHRONIZATION;

DEPTH OF FOCUS; ELECTRON BEAM DEFLECTION CONTROL; ELECTRON PROJECTION LITHOGRAPHY; SYNCHRONIZATION CONTROL;

ELECTRON BEAMS;

EID: 0141836073     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.484972     Document Type: Conference Paper

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