Low-stress and high-reflective molybdenum/silicon multilayers deposited by low-pressure rotary magnet cathode sputtering for EUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5374, Issue PART 1, 2004, Pages 104-111

  Shiraishi, Masayuki ^a   Kandaka, Noriaki ^a   Murakami, Katsuhiko ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

Extreme ultraviolet; Extreme ultraviolet lithography; Mo si multilayer; Rotary magnet cathode; Sputtering; Stress control; Xenon gas

Indexed keywords

APPROXIMATION THEORY; CATHODES; MAGNETS; MOLYBDENUM; MULTILAYERS; SILICON; SPUTTERING; STRESS ANALYSIS;

EXTREME ULTRAVIOLET; EXTREME ULTRAVIOLET LITHOGRAPHY; MO/SI MULTILAYER; ROTARY MAGNET CATHODE; STRESS CONTROL; XENON GAS;

LITHOGRAPHY;

EID: 3843093775     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.536075     Document Type: Conference Paper

References (9)

1. C. Gwyn, et al., "Extreme Ultraviolet Lithography, A White Paper," EUV LLC (1999).
2. H. Meiling, et al., "EXTATIC, ASML's α-tool development for EUVL," Proc. SPIE 4688, pp. 52-63 (2002).
3. D. A. Tichenor, et al., "Performance upgrades in the EUV Engineering Test Stand," Proc. SPIE 4688, pp. 72-86 (2002).
4. C. Montcalm, et al., "Multilayer reflective coatings for extreme-ultraviolet lithography," Proc. SPIE 3331, pp. 42-51 (1998).
5. M. Shiraishi, et al., "Mo/Si multilayers fabricated by RMC sputtering," Extended Abstracts (The 49th Spring Meeting), The Japan Society of Applied Physics and Related Societies, p.700 (2002).
6. M. Shiraishi, et al., "Mo/Si multilayers deposited by low-pressure rotary magnet cathode sputtering for extreme ultraviolet lithography," Proc. SPIE 5037, pp. 249-256 (2003).
7. K. Murakami, et al., "Development of Mo/Si multilayers deposited by low-pressure rotary magnet cathode sputtering for EUV lithography," Proc. SPIE 5193 (2003).
8. P. B. Mirkarimi, et al., "Advances in the reduction and compensation of film stress in high-reflectance multilayer coatings for extreme ultraviolet lithography," Proc. of SPIE 3331, pp. 133-148 (1998).
9. E. Zoethout, et al., "Stress mitigation in Mo/Si multilayers for EUV lithography," Proc. of SPIE 5037 (2003).