Canon's development status of EUVL technologies

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6921, Issue , 2008, Pages

  Uzawa, Shigeyuki ^a   Kubo, Hiroyoshi ^a   Miwa, Yoshinori ^a   Tsuji, Toshihiko ^a   Morishima, Hideki ^a   Kajiyama, Kazuhiko ^a   Hasegawa, Takayuki ^a  

^a CANON INC   (Japan)

Author keywords

Aberration; EUVL; Exposure tool; Lithography; Wavefront

Indexed keywords

EXPOSURE TOOL; EXTREME ULTRAVIOLET; FIELD EXPOSURE; FULL-FIELD; LEADING EDGE TECHNOLOGY; MANUFACTURING TECHNOLOGIES; PROJECTION OPTICS;

EQUIPMENT; EXPOSURE METERS; EXTREME ULTRAVIOLET LITHOGRAPHY; OPTICS; SYSTEMS ANALYSIS;

TECHNOLOGY;

EID: 50149110856     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.769894     Document Type: Conference Paper

References (3)

1. M. Amemiya et al., "Particle-free mask handling technique and dual-pod carrier", SPIE Advanced litho., 6921- 142(2008).
2. T. Nakayama et al., "Phenomelogical analysis of carbon deposition rate", SPIE Advanced litho., 6921-124(2008).
3. yonekawa et al., "A short-pulsed laser cleaning system for EUVL tool", Proceeding of SPIE, Vol.6517 65172U(2007).