Simulation of resist heating in electron beam lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3048, Issue , 1997, Pages 374-381

  Babin, S ^a   Kuzmin, I Yu ^b  

^a Etec Systems Inc   (United States)

^b Set Service   (Russian Federation)

Author keywords

Electron lithography; Pattern distortion; Resist heating

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; HEATING;

DYNAMIC DISTRIBUTION; ELECTRON EXPOSURE; MULTILAYER SUBSTRATE; NUMBER OF LAYERS; NUMERICAL CALCULATION; PATTERN DISTORTION; SPECIAL FUNCTIONS; VARIABLY SHAPED BEAMS;

GAUSSIAN BEAMS;

EID: 0040411973     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.275801     Document Type: Conference Paper

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