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Volumn 2884, Issue , 1996, Pages 520-526
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Advanced model for resist heating effect simulation in electron-beam lithography
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Author keywords
Electron lithography; Resist heating
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Indexed keywords
ELECTRON BEAM LITHOGRAPHY;
FUNCTIONS;
GAUSSIAN BEAMS;
HEATING;
MULTILAYERS;
NUMERICAL ANALYSIS;
THREE DIMENSIONAL;
ADVANCED MODELS;
ANALYTICAL SOLUTIONS;
CONDUCTIVITY EQUATIONS;
DYNAMIC DISTRIBUTIONS;
LONG TIMES;
MULTILAYER SUBSTRATES;
NUMERICAL CALCULATIONS;
RESIST HEATING;
RESIST HEATING EFFECTS;
SPECIAL FUNCTIONS;
VARIABLY SHAPED BEAMS;
MATHEMATICAL MODELS;
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EID: 0001637866
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.262844 Document Type: Conference Paper |
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Times cited : (16)
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References (12)
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