Performance of the beta-tool for low energy electron-beam proximity-projection lithography (LEEPL)

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 II, Issue , 2003, Pages 599-610

  Yoshida, Akira ^a   Kasahara, Haruo ^a   Higuchi, Akira ^a   Nozue, Hiroshi ^a   Endo, Akihiro ^a   Shimazu, Nobuo ^a  

^a LEEPL Corporation   (Japan)

Author keywords

1x mask; Electron beam; LEEPL; Lithography; Low energy; Multilayer resist; Next generation lithography; Proximity projection; Stencil mask; Vacuum pod

Indexed keywords

CURRENT DENSITY; ELECTRIC SPACE CHARGE; ELECTRON BEAMS; ELECTRON OPTICS; MASKS; OPTICAL MULTILAYERS; PHOTORESISTS; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS;

FINE TUNING DEFLECTOR; LOW ENERGY ELECTRON BEAM PROXIMITY PROJECTION LITHOGRAPHY; MASK DISTORTION; NEXT GENERATION LITHOGRAPHY; PROXIMITY PROJECTION; STENCIL MASK;

ELECTRON BEAM LITHOGRAPHY;

EID: 0141501288     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.484422     Document Type: Conference Paper

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6. A. Endo, 2nd LEEPL Forum (2002)
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8. X. Li, T. Miyatake, S. Hirose, M. Hirose, K. Fujii and K. Suzuki, Proceedings of SPIE, 4343, 164 (2001)